发明授权
- 专利标题: Method and apparatus for detecting defects
- 专利标题(中): 检测缺陷的方法和装置
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申请号: US11602247申请日: 2006-11-21
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公开(公告)号: US07440092B2公开(公告)日: 2008-10-21
- 发明人: Yukihiro Shibata , Shunji Maeda
- 申请人: Yukihiro Shibata , Shunji Maeda
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2000-391825 20001220
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; G06K9/00
摘要:
A method and apparatus for detecting a defect in which image signals of a same area of a sample are obtained by imaging the sample under different optical conditions, and the obtained image signals are analyzed and optical conditions are selected which modify a contrast in the image signal. Image signals of the sample under the selected optical conditions are obtained by imaging the sample with an inspection system, and the images under the selected optical conditions are evaluated to adjust optical conditions for inspection including an inspection threshold, which is greater than a maximum contrast difference among false defects detected at the step of obtaining and with which a maximum number of actual defects can be detected. A defect of the sample is detected by processing the image signals of the sample obtained through the inspection system under the adjusted optical conditions.
公开/授权文献
- US20070064225A1 Method and apparatus for detecting defects 公开/授权日:2007-03-22
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