发明授权
- 专利标题: Processes for forming backplanes for electro-optic displays
- 专利标题(中): 用于形成电光显示器背板的工艺
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申请号: US11424258申请日: 2006-06-15
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公开(公告)号: US07442587B2公开(公告)日: 2008-10-28
- 发明人: Karl R. Amundson , Guy M. Danner , Gregg M. Duthaler , Peter T. Kazlas , Yu Chen , Kevin L. Denis , Nathan R. Kane , Andrew P. Ritenour
- 申请人: Karl R. Amundson , Guy M. Danner , Gregg M. Duthaler , Peter T. Kazlas , Yu Chen , Kevin L. Denis , Nathan R. Kane , Andrew P. Ritenour
- 申请人地址: US MA Cambridge
- 专利权人: E Ink Corporation
- 当前专利权人: E Ink Corporation
- 当前专利权人地址: US MA Cambridge
- 代理商 David J. Cole
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A non-linear element is formed on a flexible substrate by securing the substrate to a rigid carrier, forming the non-linear element, and then separating the flexible substrate from the carrier. The process allows flexible substrates to be processed in a conventional fab intended to process rigid substrates. In a second method, a transistor is formed on a insulating substrate by forming gate electrodes, depositing a dielectric layer, a semiconductor layer and a conductive layer, patterning the conductive layer to form source, drain and pixel electrodes, covering the channel region of the resultant transistor with an etch-resistant material and etching using the etch-resistant material and the conductive layer as a mask, the etching extending substantially through the semiconductor layer between adjacent transistors. The invention also provides a process for forming a diode on a substrate by depositing on the substrate a first conductive layer, and a second patterned conductive layer and a patterned dielectric layer over parts of the first conductive layer, and etching the first conductive layer using the second conductive layer and dielectric layer as an etch mask. Finally, the invention provides a process for driving an impulse-sensitive electro-optic display.
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