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    Processes for forming backplanes for electro-optic displays
    2.
    发明授权
    Processes for forming backplanes for electro-optic displays 有权
    用于形成电光显示器背板的工艺

    公开(公告)号：US08389381B2

    公开(公告)日：2013-03-05

    申请号：US12825991

    申请日：2010-06-29

    Applicant: Karl R. Amundson ,  Guy M. Danner ,  Gregg M. Duthaler ,  Peter T. Kazlas ,  Yu Chen ,  Kevin L. Denis ,  Nathan R. Kane ,  Andrew P. Ritenour

    Inventor： Karl R. Amundson ,  Guy M. Danner ,  Gregg M. Duthaler ,  Peter T. Kazlas ,  Yu Chen ,  Kevin L. Denis ,  Nathan R. Kane ,  Andrew P. Ritenour

    IPC: H01L21/30

    CPC classification number: H01L27/1266 ,  B60C23/04 ,  G02F1/133305 ,  G02F1/1362 ,  G02F1/167 ,  G02F2001/13613 ,  H01L27/1214 ,  H01L27/1288 ,  H01L29/66765 ,  H01L29/78603

    Abstract: A non-linear element is formed on a flexible substrate by securing the substrate to a rigid carrier, forming the non-linear element, and then separating the flexible substrate from the carrier. The process allows flexible substrates to be processed in a conventional fab intended to process rigid substrates. In a second method, a transistor is formed on a insulating substrate by forming gate electrodes, depositing a dielectric layer, a semiconductor layer and a conductive layer, patterning the conductive layer to form source, drain and pixel electrodes, covering the channel region of the resultant transistor with an etch-resistant material and etching using the etch-resistant material and the conductive layer as a mask, the etching extending substantially through the semiconductor layer between adjacent transistors. The invention also provides a process for forming a diode on a substrate by depositing on the substrate a first conductive layer, and a second patterned conductive layer and a patterned dielectric layer over parts of the first conductive layer, and etching the first conductive layer using the second conductive layer and dielectric layer as an etch mask. Finally, the invention provides a process for driving an impulse-sensitive electro-optic display.

    Abstract translation: 通过将基板固定到刚性载体上，形成非线性元件，然后将柔性基板与载体分离，在柔性基板上形成非线性元件。 该方法允许柔性基底在旨在处理刚性基底的常规晶圆中进行加工。 在第二种方法中，通过形成栅电极，沉积介电层，半导体层和导电层，在绝缘基板上形成晶体管，图案化导电层以形成源极，漏极和像素电极，覆盖该沟道区 具有耐蚀刻材料的合成晶体管和使用耐蚀刻材料和导电层作为掩模的蚀刻，蚀刻基本上延伸通过相邻晶体管之间的半导体层。 本发明还提供了一种通过在衬底上沉积第一导电层以及第二图案化导电层和在第一导电层的部分上的图案化电介质层在衬底上形成二极管的工艺，并且使用 第二导电层和介电层作为蚀刻掩模。 最后，本发明提供一种驱动脉冲敏感电光显示器的方法。

    Processes for forming backplanes for electro-optic displays
    4.
    发明授权
    Processes for forming backplanes for electro-optic displays 失效
    用于形成电光显示器背板的工艺

    公开(公告)号：US07442587B2

    公开(公告)日：2008-10-28

    申请号：US11424258

    申请日：2006-06-15

    Applicant: Karl R. Amundson ,  Guy M. Danner ,  Gregg M. Duthaler ,  Peter T. Kazlas ,  Yu Chen ,  Kevin L. Denis ,  Nathan R. Kane ,  Andrew P. Ritenour

    Inventor： Karl R. Amundson ,  Guy M. Danner ,  Gregg M. Duthaler ,  Peter T. Kazlas ,  Yu Chen ,  Kevin L. Denis ,  Nathan R. Kane ,  Andrew P. Ritenour

    IPC: H01L21/00

    CPC classification number: H01L27/1266 ,  B60C23/04 ,  G02F1/133305 ,  G02F1/1362 ,  G02F1/167 ,  G02F2001/13613 ,  H01L27/1214 ,  H01L27/1288 ,  H01L29/66765 ,  H01L29/78603

    Abstract: A non-linear element is formed on a flexible substrate by securing the substrate to a rigid carrier, forming the non-linear element, and then separating the flexible substrate from the carrier. The process allows flexible substrates to be processed in a conventional fab intended to process rigid substrates. In a second method, a transistor is formed on a insulating substrate by forming gate electrodes, depositing a dielectric layer, a semiconductor layer and a conductive layer, patterning the conductive layer to form source, drain and pixel electrodes, covering the channel region of the resultant transistor with an etch-resistant material and etching using the etch-resistant material and the conductive layer as a mask, the etching extending substantially through the semiconductor layer between adjacent transistors. The invention also provides a process for forming a diode on a substrate by depositing on the substrate a first conductive layer, and a second patterned conductive layer and a patterned dielectric layer over parts of the first conductive layer, and etching the first conductive layer using the second conductive layer and dielectric layer as an etch mask. Finally, the invention provides a process for driving an impulse-sensitive electro-optic display.

    Abstract translation: 通过将基板固定到刚性载体上，形成非线性元件，然后将柔性基板与载体分离，在柔性基板上形成非线性元件。 该方法允许柔性基底在旨在处理刚性基底的常规晶圆中进行加工。 在第二种方法中，通过形成栅电极，沉积介电层，半导体层和导电层，在绝缘基板上形成晶体管，图案化导电层以形成源极，漏极和像素电极，覆盖栅极电极的沟道区 具有耐蚀刻材料的合成晶体管和使用耐蚀刻材料和导电层作为掩模的蚀刻，蚀刻基本上延伸通过相邻晶体管之间的半导体层。 本发明还提供了一种通过在衬底上沉积第一导电层以及第二图案化导电层和在第一导电层的部分上的图案化电介质层在衬底上形成二极管的工艺，并且使用 第二导电层和介电层作为蚀刻掩模。 最后，本发明提供一种驱动脉冲敏感电光显示器的方法。

    Method for controlling electro-optic display
    7.
    发明授权
    Method for controlling electro-optic display 有权
    电光显示控制方法

    公开(公告)号：US07034783B2

    公开(公告)日：2006-04-25

    申请号：US10921630

    申请日：2004-08-19

    Applicant: Holly G. Gates ,  Karl R. Amundson

    Inventor： Holly G. Gates ,  Karl R. Amundson

    IPC: G09G3/34

    CPC classification number: G09G3/344 ,  G09G3/20 ,  G09G3/34 ,  G09G3/3651 ,  G09G3/3655 ,  G09G2300/0473 ,  G09G2300/08 ,  G09G2310/0275 ,  G09G2320/0219

    Abstract: An electro-optic display comprises a bistable electro-optic medium, a plurality of pixel electrodes, with associated non-linear elements, and a common electrode, disposed on opposed sides of the electro-optic medium. The display has a writing mode, in which at least two different voltages are applied to different pixel electrodes, and a non-writing mode in which the voltages applied to the pixel electrodes are controlled so that any image previously written on the electro-optic medium is substantially maintained. The display is arranged to apply to the common electrode a first voltage when the display is in its writing mode and a second voltage, different from the first voltage, when the display is in its non-writing mode.

    Abstract translation: 电光显示器包括双稳态电光介质，具有相关联的非线性元件的多个像素电极和设置在电光介质的相对侧上的公共电极。 显示器具有写入模式，其中至少两个不同的电压被施加到不同的像素电极，并且其中施加到像素电极的电压被控制为使得先前写在电光介质上的任何图像的非写入模式 基本保持。 当显示器处于非写入模式时，显示器被布置为当显示器处于其写入模式时向公共电极施加第一电压，并且当显示器处于非写入模式时，该第一电压与第一电压不同。

    Methods for addressing electro-optic materials
    10.
    发明授权
    Methods for addressing electro-optic materials 有权
    电光材料寻址方法

    公开(公告)号：US06825970B2

    公开(公告)日：2004-11-30

    申请号：US10065055

    申请日：2002-09-13

    Applicant: Alberto Goenaga ,  Karl R. Amundson ,  Michael L. Steiner ,  Libing Zhang

    Inventor： Alberto Goenaga ,  Karl R. Amundson ,  Michael L. Steiner ,  Libing Zhang

    IPC: G02B2600

    CPC classification number: G02F1/133348 ,  G02F1/167

    Abstract: The invention provides a first process for addressing an electro-optic material having first and second display states differing in at least one optical characteristic and being capable of being changed from its first to its second display state by application of an electric field to the material, the process comprising applying an electrically charged fluid to a portion of at least one surface of the material, thereby changing the display state of a portion of the material. The invention also provides a second process for addressing an electro-optic material, this process comprising contacting the electro-optic material with a non-conductive brush means wet with a conductive liquid while applying a potential difference between the brush means and the electro-optic material.

    Abstract translation: 本发明提供了一种用于寻址具有在至少一个光学特性上不同的第一和第二显示状态并且能够通过向该材料施加电场而从其第一显示状态改变到第二显示状态的电光材料的第一过程， 所述方法包括将带电流体施加到所述材料的至少一个表面的一部分，从而改变所述材料的一部分的显示状态。 本发明还提供了一种用于寻址电光材料的第二种方法，该方法包括使电光材料与润湿导电液体的非导电刷装置接触，同时在刷装置和电光学器件之间施加电位差 材料。

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