发明授权
US07446881B2 System, apparatus, and method for determining temperature/thickness of an object using light interference measurements
有权
用于使用光干涉测量来确定物体的温度/厚度的系统,装置和方法
- 专利标题: System, apparatus, and method for determining temperature/thickness of an object using light interference measurements
- 专利标题(中): 用于使用光干涉测量来确定物体的温度/厚度的系统,装置和方法
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申请号: US11325504申请日: 2006-01-05
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公开(公告)号: US07446881B2公开(公告)日: 2008-11-04
- 发明人: Tomohiro Suzuki , Chishio Koshimizu
- 申请人: Tomohiro Suzuki , Chishio Koshimizu
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2005-005309 20050112
- 主分类号: G01B11/02
- IPC分类号: G01B11/02 ; G01B9/02
摘要:
A measuring apparatus including a light source that emits light with a wavelength that allows the light to be transmitted through and reflected at each measurement target, a splitter that splits the light from the light source into measurement light and reference light, a reference mirror at which the reference light from the splitter is reflected, a mechanism for driving the reference mirror to adjust the optical path length of the reference light reflected from the reference mirror and a mechanism for measuring the interference of the reference light reflected from the reference mirror as the reference light from the splitter is radiated toward the reference mirror and measurement beams reflected from a plurality of measurement targets as the measurement light from the splitter is radiated toward the measurement targets so as to be transmitted through the measurement targets.
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