发明授权
- 专利标题: Matching optical metrology tools using diffraction signals
- 专利标题(中): 使用衍射信号匹配光学测量工具
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申请号: US11438806申请日: 2006-05-22
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公开(公告)号: US07446888B2公开(公告)日: 2008-11-04
- 发明人: Fred Stanke , Holger Tuitje , Shigeru Nagano
- 申请人: Fred Stanke , Holger Tuitje , Shigeru Nagano
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Morrison & Foerster LLP
- 主分类号: G01B11/14
- IPC分类号: G01B11/14 ; G01B11/00
摘要:
Optical metrology tools in a fleet of optical metrology tools can be matched using transforms. In particular, a first set of measured diffraction signals is obtained. The first set of measured diffraction signals was measured using a first optical metrology tool from the fleet of optical metrology tools. A second set of measured diffraction signals is obtained. The second set of diffraction signals was measured using a second optical metrology tool from the fleet of optical metrology tools. A reference diffraction signal is obtained. A first transform is generated based on the first set of measured diffraction signals and the reference diffraction signal. A second transform is generated based on the second set of measured diffraction signals and the reference diffraction signal.
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