发明授权
US07452753B2 Method of processing a semiconductor wafer for manufacture of semiconductor device
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用于制造半导体器件的半导体晶片的处理方法
- 专利标题: Method of processing a semiconductor wafer for manufacture of semiconductor device
- 专利标题(中): 用于制造半导体器件的半导体晶片的处理方法
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申请号: US11172689申请日: 2005-06-30
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公开(公告)号: US07452753B2公开(公告)日: 2008-11-18
- 发明人: Dae-Sang Chun , Jae-Hong Kim , Heui-Seog Kim , Jong-Keun Jeon , Wha-Su Sin
- 申请人: Dae-Sang Chun , Jae-Hong Kim , Heui-Seog Kim , Jong-Keun Jeon , Wha-Su Sin
- 申请人地址: KR Suwon-si, Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si, Gyeonggi-do
- 代理机构: Marger Johnson & McCollom, P.C.
- 优先权: KR10-2004-0052310 20040706
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method of processing a semiconductor wafer that has a first surface and a second surface opposite to the first surface. The method includes forming grooves of a predetermined depth on the second surface on which circuit patterns are formed, attaching a first surface of a protective tape to the second surface on which the grooves are formed, attaching a carrier tape to a second surface of the protective tape opposite to the first surface of the protective tape so that the first surface of the semiconductor wafer can be oriented upward, removing the first surface of the semiconductor wafer by a predetermined thickness and dividing the semiconductor wafer into chips by the grooves, and supplying each chip to a die bonder in the state where the first surface of the of the chip is oriented upward. Only one kind of die bonder is needed. A UV-type tape is not required.
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