发明授权
- 专利标题: Projection exposure apparatus
- 专利标题(中): 投影曝光装置
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申请号: US11657925申请日: 2007-01-25
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公开(公告)号: US07463422B2公开(公告)日: 2008-12-09
- 发明人: Vladimir Kamenow , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf von Buenau , Hans-Juergen Mann , Alexander Epple
- 申请人: Vladimir Kamenow , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf von Buenau , Hans-Juergen Mann , Alexander Epple
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: DE Oberkochen
- 代理机构: Fish & Richardson P.C.
- 主分类号: G02B17/00
- IPC分类号: G02B17/00
摘要:
A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.
公开/授权文献
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IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |