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US07465981B2 Semiconductor device and a method of manufacturing the same 失效
半导体装置及其制造方法

Semiconductor device and a method of manufacturing the same
Abstract:
A semiconductor device includes a semiconductor substrate; a first electrode formed over the semiconductor substrate; a first insulation film covering the first electrode and having an aperture for exposing a part of the first electrode; a first conductive film formed on a part of the first insulation film and the first electrode inside the aperture; an isolation region placed inside the aperture; and a second conductive film formed on the first conductive film and the isolation region.
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