发明授权
- 专利标题： Hollow cathode target and methods of making same
- 专利标题（中）： 空心阴极靶及其制作方法
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申请号： US11091029申请日： 2005-03-28
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公开(公告)号： US07468110B2公开(公告)日： 2008-12-23
- 发明人: Robert B. Ford , Christopher A. Michaluk
- 申请人： Robert B. Ford , Christopher A. Michaluk
- 申请人地址： US MA Boston
- 专利权人： Cabot Corporation
- 当前专利权人： Cabot Corporation
- 当前专利权人地址： US MA Boston
- 主分类号： C22F1/18
- IPC分类号： C22F1/18 ; C22F1/08 ; C23C14/34 ; C23C14/00 ; C25B9/00 ; C25B11/00 ; C21D1/00
摘要：
Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.
公开/授权文献
- US20050167015A1 Hollow cathode target and methods of making same 公开/授权日：2005-08-04
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