发明授权
- 专利标题: Arrangement of optical elements in a microlithographic projection exposure apparatus
- 专利标题(中): 微光刻投影曝光装置中的光学元件的布置
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申请号: US11232606申请日: 2005-09-22
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公开(公告)号: US07474469B2公开(公告)日: 2009-01-06
- 发明人: Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder , Wolfgang Singer
- 申请人: Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder , Wolfgang Singer
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: DE Oberkochen
- 代理机构: Fish & Richardson P.C.
- 主分类号: G02B3/12
- IPC分类号: G02B3/12 ; G02B3/00
摘要:
The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.
公开/授权文献
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B3/00 | 简单或复合透镜 |
G02B3/12 | .充入液体或抽空的透镜 |