利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

156 条记录 (耗时 0.039 秒)

    Projection objective of a microlithographic projection exposure apparatus
    4.
    发明授权
    Projection objective of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的投影目标

    公开(公告)号：US08325426B2

    公开(公告)日：2012-12-04

    申请号：US13156819

    申请日：2011-06-09

    申请人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    发明人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    IPC分类号： G02B15/14

    CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

    摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

    摘要翻译： 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件。 该元件具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

    Projection objective of a microlithographic projection exposure apparatus
    6.
    发明授权
    Projection objective of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的投影目标

    公开(公告)号：US07982969B2

    公开(公告)日：2011-07-19

    申请号：US12330980

    申请日：2008-12-09

    申请人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    发明人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    IPC分类号： G02B15/14

    CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

    摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

    摘要翻译： 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件。 该元件具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

    OBJECTIVES AS A MICROLITHOGRAPHY PROJECTION OBJECTIVE WITH AT LEAST ONE LIQUID LENS
    7.
    发明申请
    OBJECTIVES AS A MICROLITHOGRAPHY PROJECTION OBJECTIVE WITH AT LEAST ONE LIQUID LENS 有权
    目标作为目标与一个液晶镜头的微观图像投影

    公开(公告)号：US20080030869A1

    公开(公告)日：2008-02-07

    申请号：US11758363

    申请日：2007-06-05

    申请人： David Shafer ,  Susanne Beder ,  Karl-Heinz Schuster ,  Wolfgang Singer

    发明人： David Shafer ,  Susanne Beder ,  Karl-Heinz Schuster ,  Wolfgang Singer

    IPC分类号： G02B3/12

    CPC分类号： G02B3/12 ,  G02B17/0812 ,  G02B17/0856 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

    摘要翻译： 本发明涉及被设计为用于工作波长的微光刻投射物镜的物镜。 目标具有最大的可调节图像侧数值孔径NA，由实心透明体，特别是玻璃或晶体制成的至少一个第一透镜，具有折射率n L L和至少一个液体透镜 （F）由透明液体制成，具有折射率n F F。 在工作波长下，第一透镜具有物镜的所有实心透镜的最大折射率n L L，所述至少一个液体透镜的折射率n F ）大于第一透镜的折射率nLL ，并且数值孔径NA的值大于1。

    Objectives as a microlithography projection objective with at least one liquid lens
    8.
    发明授权
    Objectives as a microlithography projection objective with at least one liquid lens 有权
    目标作为具有至少一个液体透镜的微光刻投影物镜

    公开(公告)号：US07428105B2

    公开(公告)日：2008-09-23

    申请号：US11758363

    申请日：2007-06-05

    申请人： David R. Shafer ,  Susanne Beder ,  Karl-Heinz Schuster ,  Wolfgang Singer

    发明人： David R. Shafer ,  Susanne Beder ,  Karl-Heinz Schuster ,  Wolfgang Singer

    IPC分类号： G02B9/00 ,  G02B1/06

    CPC分类号： G02B3/12 ,  G02B17/0812 ,  G02B17/0856 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

    摘要翻译： 本发明涉及被设计为用于工作波长的微光刻投射物镜的物镜。 目标具有最大的可调节图像侧数值孔径NA，由实心透明体，特别是玻璃或晶体制成的至少一个第一透镜，具有折射率n L L和至少一个液体透镜 （F）由透明液体制成，具有折射率n F F。 在工作波长下，第一透镜具有物镜的所有实心透镜的最大折射率n L L，所述至少一个液体透镜的折射率n F ）大于第一透镜的折射率nLL ，并且数值孔径NA的值大于1。

    Projection objective having a high aperture and a planar end surface
    10.
    发明申请
    Projection objective having a high aperture and a planar end surface 有权
    具有高孔径和平坦端面的投射物镜

    公开(公告)号：US20060012885A1

    公开(公告)日：2006-01-19

    申请号：US11151465

    申请日：2005-06-14

    申请人： Susanne Beder ,  Wolfgang Singer ,  Karl-Heinz Schuster

    发明人： Susanne Beder ,  Wolfgang Singer ,  Karl-Heinz Schuster

    IPC分类号： G02B3/00

    CPC分类号： G02B17/0892 ,  B82Y10/00 ,  G02B17/0804 ,  G02B17/0812 ,  G03F7/70225 ,  G03F7/70325 ,  G03F7/70341 ,  G03F7/70958

    摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.

    摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的适合于微光刻投影曝光机的投影物镜的平面上的投影物镜具有在投影物镜的工作波长处对于辐射而透明的多个光学元件。 至少一个光学元件是在工作波长处由折射率n> = 1.6的高折射率材料制成的高折射率光学元件。