发明授权
- 专利标题: Phase-changeable memory devices including nitrogen and/or silicon dopants
- 专利标题(中): 包括氮和/或硅掺杂剂的相变存储器件
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申请号: US11755307申请日: 2007-05-30
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公开(公告)号: US07476917B2公开(公告)日: 2009-01-13
- 发明人: Horii Hideki , Bong-Jin Kuh , Yong-Ho Ha , Jeong-hee Park , Ji-Hye Yi
- 申请人: Horii Hideki , Bong-Jin Kuh , Yong-Ho Ha , Jeong-hee Park , Ji-Hye Yi
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec
- 优先权: KR10-2004-0012358 20040224
- 主分类号: H01L27/148
- IPC分类号: H01L27/148 ; H01L29/768
摘要:
A phase-changeable memory device includes a substrate having a field effect transistor therein and a phase-changeable material electrically coupled to a source region of the field effect transistor. The phase-changeable material includes a chalcogenide composition containing at least germanium, bismuth and tellurium and at least one dopant selected from a group consisting of nitrogen and silicon.
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