发明授权
- 专利标题: Ohmic contact on p-type GaN
- 专利标题(中): p型GaN上的欧姆接触
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申请号: US11234993申请日: 2005-09-26
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公开(公告)号: US07495314B2公开(公告)日: 2009-02-24
- 发明人: Jeffrey N. Miller , David P. Bour , Virginia M. Robbins , Steven D. Lester
- 申请人: Jeffrey N. Miller , David P. Bour , Virginia M. Robbins , Steven D. Lester
- 申请人地址: SG Singapore
- 专利权人: Avago Technologies ECBU IP (Singapore) Pte. Ltd.
- 当前专利权人: Avago Technologies ECBU IP (Singapore) Pte. Ltd.
- 当前专利权人地址: SG Singapore
- 主分类号: H01L29/22
- IPC分类号: H01L29/22
摘要:
An ohmic contact in accordance with the invention includes a layer of p-type GaN-based material. A first layer of a group II-VI compound semiconductor is located adjacent to the layer of p-type GaN-based material. The ohmic contact further includes a metal layer that provides metal contact. A second layer of a different II-VI compound semiconductor is located adjacent to the metal layer.
公开/授权文献
- US20070069380A1 Ohmic contact on p-type GaN 公开/授权日:2007-03-29
信息查询
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