Invention Grant
- Patent Title: Method for manufacturing substrate with cavity
- Patent Title (中): 用腔体制造衬底的方法
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Application No.: US11524404Application Date: 2006-09-21
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Publication No.: US07498205B2Publication Date: 2009-03-03
- Inventor: Hoe Ku Jung , Myung Sam Kang , Jung Hyun Park
- Applicant: Hoe Ku Jung , Myung Sam Kang , Jung Hyun Park
- Applicant Address: KR Suwon
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon
- Priority: KR10-2005-0088089 20050922
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for manufacturing a substrate having a cavity which includes forming a barrier around a predetermined area where the cavity is to be formed on a copper foil laminated master, an internal circuit formed in the copper foil laminated master; coating a thermosetting material in the area where the cavity is to be formed; laminating a dielectric layer and a copper foil layer on the copper foil laminated master, on which the thermosetting material is coated; pressing the laminated dielectric layer and copper foil layer using a press plate, on which a protruded part is formed in an area corresponding to the area where the cavity is to be formed; forming an external circuit pattern in the upper part of the laminated dielectric layer; and dissolving the coated thermosetting material using a solvent and forming the cavity.
Public/Granted literature
- US20070066045A1 Method for manufacturing substrate with cavity Public/Granted day:2007-03-22
Information query
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