发明授权
US07498608B2 Nitride-composite semiconductor laser element, its manufacturing method, and semiconductor optical device
有权
氮化物复合半导体激光元件,其制造方法和半导体光学器件
- 专利标题: Nitride-composite semiconductor laser element, its manufacturing method, and semiconductor optical device
- 专利标题(中): 氮化物复合半导体激光元件,其制造方法和半导体光学器件
-
申请号: US10493137申请日: 2002-10-28
-
公开(公告)号: US07498608B2公开(公告)日: 2009-03-03
- 发明人: Shigetoshi Ito , Takayuki Yuasa , Yoshihiro Ueta , Mototaka Taneya , Zenpei Tani , Kensaku Motoki
- 申请人: Shigetoshi Ito , Takayuki Yuasa , Yoshihiro Ueta , Mototaka Taneya , Zenpei Tani , Kensaku Motoki
- 申请人地址: JP Osaka JP Osaka
- 专利权人: Sharp Kabushiki Kaisha,Sumitomo Electric Industries, Ltd.
- 当前专利权人: Sharp Kabushiki Kaisha,Sumitomo Electric Industries, Ltd.
- 当前专利权人地址: JP Osaka JP Osaka
- 代理机构: Morrison & Foerster LLP
- 优先权: JP2001-330068 20011029; JP2001-330181 20011029
- 国际申请: PCT/JP02/11186 WO 20021028
- 国际公布: WO03/038957 WO 20030508
- 主分类号: H01L33/00
- IPC分类号: H01L33/00
摘要:
A nitride semiconductor laser device with a reduction in internal crystal defects and an alleviation in stress, and a semiconductor optical apparatus comprising this nitride semiconductor laser device. First, a growth suppressing film against GaN crystal growth is formed on the surface of an n-type GaN substrate equipped with alternate stripes of dislocation concentrated regions showing a high density of crystal defects and low-dislocation regions so as to coat the dislocation concentrate regions. Next, the n-type GaN substrate coated with the growth suppressing film is overlaid with a nitride semiconductor layer by the epitaxial growth of GaN crystals. Further, the growth suppressing film is removed to adjust the lateral distance between a laser waveguide region and the closest dislocation concentrated region to 40 μm or more.
公开/授权文献
信息查询
IPC分类: