发明授权
US07498608B2 Nitride-composite semiconductor laser element, its manufacturing method, and semiconductor optical device 有权
氮化物复合半导体激光元件,其制造方法和半导体光学器件

Nitride-composite semiconductor laser element, its manufacturing method, and semiconductor optical device
摘要:
A nitride semiconductor laser device with a reduction in internal crystal defects and an alleviation in stress, and a semiconductor optical apparatus comprising this nitride semiconductor laser device. First, a growth suppressing film against GaN crystal growth is formed on the surface of an n-type GaN substrate equipped with alternate stripes of dislocation concentrated regions showing a high density of crystal defects and low-dislocation regions so as to coat the dislocation concentrate regions. Next, the n-type GaN substrate coated with the growth suppressing film is overlaid with a nitride semiconductor layer by the epitaxial growth of GaN crystals. Further, the growth suppressing film is removed to adjust the lateral distance between a laser waveguide region and the closest dislocation concentrated region to 40 μm or more.
信息查询
0/0