发明授权
US07515282B2 Modeling and measuring structures with spatially varying properties in optical metrology
有权
光学计量学中具有空间变化特性的建模和测量结构
- 专利标题： Modeling and measuring structures with spatially varying properties in optical metrology
- 专利标题（中）： 光学计量学中具有空间变化特性的建模和测量结构
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申请号： US11173198申请日： 2005-07-01
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公开(公告)号： US07515282B2公开(公告)日： 2009-04-07
- 发明人: Shifang Li , Vi Vuong , Alan Nolet , Junwei Bao
- 申请人： Shifang Li , Vi Vuong , Alan Nolet , Junwei Bao
- 申请人地址： US CA Santa Clara
- 专利权人： Timbre Technologies, Inc.
- 当前专利权人： Timbre Technologies, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Morrison & Foerster LLP
- 主分类号： G01B11/14
- IPC分类号： G01B11/14
摘要：
The profile of a structure having a region with a spatially varying property is modeled using an optical metrology model. A set of profile parameters is defined for the optical metrology model to characterize the profile of the structure. A set of layers is defined for a portion the optical metrology model that corresponds to the region of the structure with the spatially varying property, each layer having a defined height and width. For each layer, a mathematic function that varies across at least a portion of the width of the layer is defined to characterize the spatially varying property within a corresponding layer in the region of the structure.
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