Invention Grant
US07515282B2 Modeling and measuring structures with spatially varying properties in optical metrology
有权
光学计量学中具有空间变化特性的建模和测量结构
- Patent Title: Modeling and measuring structures with spatially varying properties in optical metrology
- Patent Title (中): 光学计量学中具有空间变化特性的建模和测量结构
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Application No.: US11173198Application Date: 2005-07-01
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Publication No.: US07515282B2Publication Date: 2009-04-07
- Inventor: Shifang Li , Vi Vuong , Alan Nolet , Junwei Bao
- Applicant: Shifang Li , Vi Vuong , Alan Nolet , Junwei Bao
- Applicant Address: US CA Santa Clara
- Assignee: Timbre Technologies, Inc.
- Current Assignee: Timbre Technologies, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Morrison & Foerster LLP
- Main IPC: G01B11/14
- IPC: G01B11/14

Abstract:
The profile of a structure having a region with a spatially varying property is modeled using an optical metrology model. A set of profile parameters is defined for the optical metrology model to characterize the profile of the structure. A set of layers is defined for a portion the optical metrology model that corresponds to the region of the structure with the spatially varying property, each layer having a defined height and width. For each layer, a mathematic function that varies across at least a portion of the width of the layer is defined to characterize the spatially varying property within a corresponding layer in the region of the structure.
Public/Granted literature
- US20070002337A1 Modeling and measuring structures with spatially varying properties in optical metrology Public/Granted day:2007-01-04
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