Invention Grant
- Patent Title: Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
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Application No.: US11984942Application Date: 2007-11-26
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Publication No.: US07521282B2Publication Date: 2009-04-21
- Inventor: Tetsuya Yamamoto , Atsutoshi Arakawa , Kenji Sato , Toshiaki Asahi
- Applicant: Tetsuya Yamamoto , Atsutoshi Arakawa , Kenji Sato , Toshiaki Asahi
- Applicant Address: JP Tokyo
- Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch and Birch, LLP
- Priority: JP2001-106295 20010404; JP2001-204419 20010705; JP2001-330193 20011029; JP2001-330194 20011029
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
The present invention relates to a method for producing an n-type ZnTe system compound semiconductor single crystal having high carrier concentration and low resistivity, the ZnTe system compound semiconductor single crystal, and a semiconductor device produced by using the ZnTe system compound semiconductor as a base member. Concretely, a first dopant and a second dopant are co-doped into the ZnTe system compound semiconductor single crystal so that the number of atoms of the second dopant becomes smaller than the number of atoms of the first dopant, the first dopant being for controlling a conductivity type of the ZnTe system compound semiconductor to a first conductivity type, and the second dopant being for controlling the conductivity type to a second conductivity type different from the first conductivity type. By the present invention, a desired carrier concentration can be achieved with a doping amount smaller than in earlier technology, and crystallinity of the obtained crystal can be improved.
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