发明授权
- 专利标题: Semiconductor laser and method of fabricating the same
- 专利标题(中): 半导体激光器及其制造方法
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申请号: US11341588申请日: 2006-01-30
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公开(公告)号: US07522647B2公开(公告)日: 2009-04-21
- 发明人: Nobuaki Hatori , Tsuyoshi Yamamoto , Koji Otsubo , Yasuhiko Arakawa
- 申请人: Nobuaki Hatori , Tsuyoshi Yamamoto , Koji Otsubo , Yasuhiko Arakawa
- 申请人地址: JP Kawasaki JP Tokyo
- 专利权人: Fujitsu Limited,The University of Tokyo
- 当前专利权人: Fujitsu Limited,The University of Tokyo
- 当前专利权人地址: JP Kawasaki JP Tokyo
- 代理机构: Kratz, Quintos & Hanson, LLP
- 优先权: JP2005-104448 20050331
- 主分类号: H01S5/00
- IPC分类号: H01S5/00
摘要:
An intrinsic GaAs waveguide layer is formed on a p-type AlGaAs cladding layer, a quantum dot active layer is formed further thereon. An n-type AlGaAs cladding layer is formed on the center portion of the quantum dot active layer. Thus-configured semiconductor laser is allowed to successfully suppress the area of the p-n junction plane to a small level, and to obtain a high level of reliability, because there is no need of processing the center portion of the quantum dot active layer, contributive to laser oscillation.
公开/授权文献
- US20060222028A1 Semiconductor laser and method of fabricating the same 公开/授权日:2006-10-05
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