Invention Grant
- Patent Title: Methods including fluxless chip attach processes
- Patent Title (中): 方法包括无通芯片贴片工艺
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Application No.: US11323526Application Date: 2005-12-29
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Publication No.: US07534715B2Publication Date: 2009-05-19
- Inventor: Susheel Jadhav , Daoqiang Lu , Nitin Deshpande
- Applicant: Susheel Jadhav , Daoqiang Lu , Nitin Deshpande
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Konrad Raynes & Victor, LLP
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L21/48

Abstract:
Electronic devices and methods for fabricating electronic devices are described. One method includes providing a plurality of first metal bumps on a first surface, and a plurality of second metal bumps on a second surface, wherein at least one of (i) the plurality of first metal bumps, and (ii) the plurality of second metal bumps, comprises a solder. The method also includes forming a metal region including indium and tin, on at least one of (i) the plurality of first metal bumps, and (ii) the plurality of second metal bumps. The method also includes positioning the first metal bumps on the second metal bumps, and heating the metal bumps and the metal region and melting the solder. Other embodiments are described and claimed.
Public/Granted literature
- US20070152328A1 Fluxless chip attached processes and devices Public/Granted day:2007-07-05
Information query
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