发明授权
- 专利标题： Lithographic apparatus and methods for use thereof
- 专利标题（中）： 光刻设备及其使用方法
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申请号： US11014062申请日： 2004-12-17
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公开(公告)号： US07538875B2公开(公告)日： 2009-05-26
- 发明人: Remco Marcel Van Dijk , Donis George Flagello , Michel Fransois Hubert Klaassen , Tammo Uitterdijk
- 申请人： Remco Marcel Van Dijk , Donis George Flagello , Michel Fransois Hubert Klaassen , Tammo Uitterdijk
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： G01J4/00
- IPC分类号： G01J4/00
摘要：
A method for determining a polarization state of light passed through the projection lens of a lithographic apparatus is described. Polarizing structures are disposed on an object side of the projection lens of the lithographic apparatus. By measuring light that has passed through the polarizing structures information regarding the polarization characteristics of the projection lens can be determined.
公开/授权文献
- US20050206879A1 Lithographic apparatus and methods for use thereof 公开/授权日：2005-09-22