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    Lithographic apparatus
    4.
    发明授权
    Lithographic apparatus 有权
    平版印刷设备

    公开(公告)号：US07375799B2

    公开(公告)日：2008-05-20

    申请号：US11065349

    申请日：2005-02-25

    申请人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk

    发明人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk

    IPC分类号： G03B27/72 ,  G03B27/54

    CPC分类号： G03F7/70133 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a detector for measuring the intensity of the radiation after it has passed through the projection system. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable; and a polarization analyzer, such as a linear polarizer, wherein the polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements, using the detector, for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及用于在辐射通过投影系统之后测量辐射强度的检测器。 该装置还包括可调节的诸如四分之一波片的偏振变化元件; 以及诸如线性偏振器的偏振分析器，其中偏振改变元件和偏振分析器在辐射束路径中依次布置在图案形成装置将被支撑件保持的水平处。 通过采用强度测量，使用检测器，对于偏振变化元件的不同的旋转取向，可以获得关于在图案形成装置的电平处的辐射的偏振状态的信息。 由于偏振分析仪位于投影系统之前，测量不受检测器位于投影系统之后（例如在基板的水平面）的事实的影响。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    6.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20110279796A1

    公开(公告)日：2011-11-17

    申请号：US13189288

    申请日：2011-07-22

    申请人： Tammo Uitterdijk ,  Erik Roelof Loopstra ,  Laurens Anthony Sanderse

    发明人： Tammo Uitterdijk ,  Erik Roelof Loopstra ,  Laurens Anthony Sanderse

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/70958

    摘要： In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.

    摘要翻译： 在浸没式光刻设备中，公开了一种最终元件，其在最接近衬底的表面上具有与该层相同的材料结合到该表面并具有与层相同的材料的层，该层从该层延伸离开该衬底至该屏蔽层 来自液体的最终元素。 在一个实施例中，最终元件经由层和/或边缘屏障附接到设备，该层和/或边缘屏障可以由热膨胀系数低于最终元件的热膨胀系数的材料制成。

    Lithographic apparatus, aberration correction device and device manufacturing method
    7.
    发明授权
    Lithographic apparatus, aberration correction device and device manufacturing method 有权
    光刻设备，像差​​校正装置和器件制造方法

    公开(公告)号：US07538952B2

    公开(公告)日：2009-05-26

    申请号：US12078847

    申请日：2008-04-07

    申请人： Tammo Uitterdijk ,  Laurentius Catrinus Jorritsma

    发明人： Tammo Uitterdijk ,  Laurentius Catrinus Jorritsma

    IPC分类号： G02B3/00 ,  G03B27/42

    CPC分类号： G03F7/70891 ,  G03F7/70308 ,  G03F7/706

    摘要： An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.

    摘要翻译： 可用于光刻的像差校正装置包括两个元件，其中至少一个可以例如相对于光轴相对旋转。 每个元素的一个表面具有可被较高Zernike多项式描述的非球面形式。 当两个表面旋转对准时，该装置具有平板的光学效果。 如果两个元件的相对旋转小，器件的影响是由非球面形式的导数描述的相移。 校正装置可以用于校正由透镜加热引起的像差，特别是在照明模式和图案类型下，导致在投影系统中强大的离轴局部光瞳填充。

    Lithographic apparatus, aberration correction device and device manufacturing method
    8.
    发明申请
    Lithographic apparatus, aberration correction device and device manufacturing method 有权

    公开(公告)号：US20080212183A1

    公开(公告)日：2008-09-04

    申请号：US12078847

    申请日：2008-04-07

    申请人： Tammo Uitterdijk ,  Laurentius Catrinus Jorritsma

    发明人： Tammo Uitterdijk ,  Laurentius Catrinus Jorritsma

    IPC分类号： G02B27/64

    CPC分类号： G03F7/70891 ,  G03F7/70308 ,  G03F7/706

    摘要： An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.

    Lithographic apparatus, aberration correction device and device manufacturing method
    9.
    发明授权
    Lithographic apparatus, aberration correction device and device manufacturing method 有权
    光刻设备，像差​​校正装置和器件制造方法

    公开(公告)号：US07372633B2

    公开(公告)日：2008-05-13

    申请号：US11488172

    申请日：2006-07-18

    申请人： Tammo Uitterdijk ,  Laurentius Catrinus Jorritsma

    发明人： Tammo Uitterdijk ,  Laurentius Catrinus Jorritsma

    IPC分类号： G02B3/00 ,  G03B27/42

    CPC分类号： G03F7/70891 ,  G03F7/70308 ,  G03F7/706

    摘要： An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.

    摘要翻译： 可用于光刻的像差校正装置包括两个元件，其中至少一个可以例如相对于光轴相对旋转。 每个元素的一个表面具有可被较高Zernike多项式描述的非球面形式。 当两个表面旋转对准时，该装置具有平板的光学效果。 如果两个元件的相对旋转小，器件的影响是由非球面形式的导数描述的相移。 校正装置可以用于校正由透镜加热引起的像差，特别是在照明模式和图案类型下，导致在投影系统中强大的离轴局部光瞳填充。