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公开(公告)号：US09482967B2
公开(公告)日：2016-11-01
申请号：US13238861
申请日：2011-09-21
申请人： Marcus Adrianus Van De Kerkhof , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk , Nicolas Alban Lallemant
发明人： Marcus Adrianus Van De Kerkhof , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk , Nicolas Alban Lallemant
CPC分类号： G03F7/70858 , G03F7/70258 , G03F7/70341 , G03F7/705 , G03F7/70575 , G03F7/706
摘要： An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
摘要翻译： 公开了一种浸没式光刻设备，其具有用于分别测量和/或预测与浸没液体的温度波动相关的影响的测量系统或预测系统，以及用于控制与温度相关的或另一效应的控制系统 基于由测量系统和/或预测系统获得的测量和/或预测的浸没液体。 还公开了一种相关的控制系统和设备制造方法。
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公开(公告)号：US20140071420A1
公开(公告)日：2014-03-13
申请号：US13903885
申请日：2013-05-28
申请人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
发明人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
摘要翻译： 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。
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公开(公告)号：US07924403B2
公开(公告)日：2011-04-12
申请号：US11330401
申请日：2006-01-12
CPC分类号： G03F7/70341
摘要： A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.
摘要翻译： 公开了一种浸没式光刻设备，其中一个或多个液体转向器位于由液体限制结构包围的空间中。 液体转向器的功能是妨碍形成一个或多个浸没液体的再循环区域，这可能导致浸没液体在空间中的折射率变化，从而造成误差。
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公开(公告)号：US07405805B2
公开(公告)日：2008-07-29
申请号：US11022939
申请日：2004-12-28
CPC分类号： G03F7/70341 , G03F7/70958
摘要： In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
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5.发明授权Method for bonding a pellicle to a patterning device and patterning device comprising a pellicle 有权用于将防护薄膜组合物结合到图案形成装置的方法和包括防护薄膜组件的图案形成装置公开(公告)号：US07136152B2
公开(公告)日：2006-11-14
申请号：US10995077
申请日：2004-11-23
CPC分类号： G03F1/64 , Y10T156/10
摘要： A method is provided to reduce differences between the way in which reticle chucking forces and gravity force act upon the reticle during use and during assembly of the pellicle, and to combine this with a similar reduction concerning pellicle chucking forces and gravity force acting upon the pellicle during bonding to the reticle and during quality control of the pellicle. The shape of the pellicle is measured for control in the same orientation of the pellicle with respect to gravity force as during use of the pellicle, and during bonding the pellicle and the reticle are held in the same way and in the same orientation as during control of the pellicle and use of the reticle in the lithographic apparatus, respectively.
摘要翻译： 提供了一种减少在使用过程中和在组装防护薄膜组件期间标线片夹持力和重力作用在掩模版上的方式之间的差异，并将其与防止薄膜夹持力和作用在防护薄膜组件上的重力相类似地减少 在粘合到掩模版和防护薄膜组件的质量控制期间。 在防护薄膜组件的使用期间，防护薄膜组件的形状被测量为防护薄膜组件相对于重力的相同取向的控制，并且在粘合期间，防护薄膜组件和掩模版以与控制期间相同的方式和方向保持 并且分别在光刻设备中使用掩模版。
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公开(公告)号：US20060146304A1
公开(公告)日：2006-07-06
申请号：US11294860
申请日：2005-12-05
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70258
摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system comprises illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.
摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。
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7.发明申请Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle 失效光刻设备，器件制造方法，掩模和表征掩模和/或防护薄膜的方法公开(公告)号：US20050140949A1
公开(公告)日：2005-06-30
申请号：US10835287
申请日：2004-04-30
申请人： Johannes Jasper , Marcel Baggen , Richard Bruls , Orlando Cicilia , Hendrikus Alphonsus Van Dijck , Gerardus Carolus Hofmans , Albert Johannes Jansen , Carlo Cornelis Luijten , Willem Pongers , Martijn Dominique Wehrens , Tammo Uitterdijk , Herman Boom , Marcel Johannes Louis Demarteau
发明人： Johannes Jasper , Marcel Baggen , Richard Bruls , Orlando Cicilia , Hendrikus Alphonsus Van Dijck , Gerardus Carolus Hofmans , Albert Johannes Jansen , Carlo Cornelis Luijten , Willem Pongers , Martijn Dominique Wehrens , Tammo Uitterdijk , Herman Boom , Marcel Johannes Louis Demarteau
CPC分类号： G03F7/70258 , G03F1/62 , G03F1/64 , G03F1/82 , G03F7/70308 , G03F7/70983
摘要： A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.
摘要翻译： 允许厚的防护薄膜具有非平坦形状，并且其形状的特征在于计算在曝光中应用的校正以补偿防护薄膜的光学效果。 防护薄膜组件可以在重力的影响下被安装成采用一维形状以使补偿更容易。
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公开(公告)号：US20110279796A1
公开(公告)日：2011-11-17
申请号：US13189288
申请日：2011-07-22
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70958
摘要： In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
摘要翻译： 在浸没式光刻设备中，公开了一种最终元件，其在最接近衬底的表面上具有与该层相同的材料结合到该表面并具有与层相同的材料的层，该层从该层延伸离开该衬底至该屏蔽层 来自液体的最终元素。 在一个实施例中，最终元件经由层和/或边缘屏障附接到设备，该层和/或边缘屏障可以由热膨胀系数低于最终元件的热膨胀系数的材料制成。
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9.发明授权Lithographic apparatus, aberration correction device and device manufacturing method 有权光刻设备，像差校正装置和器件制造方法公开(公告)号：US07538952B2
公开(公告)日：2009-05-26
申请号：US12078847
申请日：2008-04-07
CPC分类号： G03F7/70891 , G03F7/70308 , G03F7/706
摘要： An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.
摘要翻译： 可用于光刻的像差校正装置包括两个元件，其中至少一个可以例如相对于光轴相对旋转。 每个元素的一个表面具有可被较高Zernike多项式描述的非球面形式。 当两个表面旋转对准时，该装置具有平板的光学效果。 如果两个元件的相对旋转小，器件的影响是由非球面形式的导数描述的相移。 校正装置可以用于校正由透镜加热引起的像差，特别是在照明模式和图案类型下，导致在投影系统中强大的离轴局部光瞳填充。
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公开(公告)号：US20080212183A1
公开(公告)日：2008-09-04
申请号：US12078847
申请日：2008-04-07
IPC分类号： G02B27/64
CPC分类号： G03F7/70891 , G03F7/70308 , G03F7/706
摘要： An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.
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