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发明授权
US07540976B2 Sputtering target for forming thin phosphor film 有权
用于形成薄荧光膜的溅射靶

Sputtering target for forming thin phosphor film
摘要：
A sputtering target for fluorescent thin-film formation comprising a matrix material and a luminescent center material,wherein said matrix material has a chemical composition represented by the following formula (1), and simultaneously satisfies conditions represented by the following inequalities (2) to (5). MIIvAxByOzSw   (1) 0.05≦v/x≦5   (2) 1≦y/x≦6   (3) 0.01≦z/(z+w)≦0.85   (4) 0.6≦(v+x+3y/2)/(z+w)≦1.5   (5) wherein MII represents one or more elements selected from the group consisting of Zn, Cd and Hg, A represents one or more elements selected from the group consisting of Mg, Ca, Sr, Ba and rare earth elements, B represents one or more elements selected from the group consisting of Al, Ga and In, and v, x, y, z and w each represent numerical values satisfying the conditions specified in the inequalities (2) to (5).
摘要（中）：

1.一种荧光薄膜形成用溅射靶，其特征在于，具有基体材料和发光中心材料，其中，所述基体材料具有下述式（1）所示的化学成分，同时满足下述不等式（2）〜（ 5）。 <？in-line-formula description =“In-line Formulas”end =“lead”？> MIIvAxByOzSw（1）<？in-line-formula description =“In-line formula”end =“tail”？> in-line-formula description =“In-line Formulas”end =“lead”？> 0.05 <= v / x <= 5（2）<？in-line-formula description =“In-line Formulas”end = 尾部“？> <？in-line-formula description =”In-line Formulas“end =”lead“？> 1 <= y / x <= 6（3）<？in-line-formula description = 行公式“end =”tail“？> <？in-line-formula description =”In-line Formulas“end =”lead“？> 0.01 <= z /（z + w）<= 0.85（4） in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> 0.6 <=（v + x + 3y / 2）/（z + w）<= 1.5（5）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中MII表示选自以下的一个或多个元素： 的Zn，Cd和Hg，A表示选自Mg，Ca，Sr，Ba和稀土元素中的一种或多种元素，B表示选自以下的一种或多种元素： 的Al，Ga和In，v，x，y，z和w分别表示满足不等式（2）〜（5）中规定的条件的数值。

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