Invention Grant
- Patent Title: Flipping stage arrangement for reduced wafer contamination cross section and improved measurement accuracy and throughput
- Patent Title (中): 翻转平台布置可减少晶圆污染截面，提高测量精度和产量
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Application No.: US11772838Application Date: 2007-07-03
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Publication No.: US07542136B2Publication Date: 2009-06-02
- Inventor: Shahin Zangooie , Lin Zhou , Roger M. Young , Clemente Bottini , Robert J. Foster , Ronald D. Fiege
- Applicant: Shahin Zangooie , Lin Zhou , Roger M. Young , Clemente Bottini , Robert J. Foster , Ronald D. Fiege
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Rosa Yaghmour
- Main IPC: G01N21/01
- IPC: G01N21/01 ; G01J4/00
Abstract:
A sample stage for performing measurements using an optical metrology system includes at least one sample section for retention of a sample, and components for controlling orientation of the sample section with relation to the optical metrology system. A method and a computer program product are provided.
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