发明授权
- 专利标题: Optical element unit for exposure processes
- 专利标题(中): 用于曝光过程的光学元件单元
-
申请号: US12008879申请日: 2008-01-15
-
公开(公告)号: US07545483B2公开(公告)日: 2009-06-09
- 发明人: Bernhard Gellrich , Jens Kugler , Thomas Schletterer , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Detlev Mueller , Dieter Schmerek
- 申请人: Bernhard Gellrich , Jens Kugler , Thomas Schletterer , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Detlev Mueller , Dieter Schmerek
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: DE Oberkochen
- 代理机构: Ohlandt, Greeley, Ruggiero & Perle, L.L.P.
- 优先权: DE102004018659 20040413
- 主分类号: G03B27/54
- IPC分类号: G03B27/54
摘要:
An optical element unit is provided comprising an optical element group; a housing receiving said optical element group and having an inner housing part and an exit end; and a purge unit connected to said housing and providing a purge medium to said inner housing part. The optical element group comprises an ultimate optical element. The ultimate optical element is located at the exit end of housing and separates the inner housing part from an environment external to the housing. The ultimate optical element and the housing define a sealing gap. The purge unit provides purge medium to the sealing gap to prevent intrusion of contaminants into the inner housing part.
公开/授权文献
- US20080192215A1 Optical element unit for exposure processes 公开/授权日:2008-08-14