Invention Grant
US07554094B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
有权
用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
- Patent Title: Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
- Patent Title (中): 用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
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Application No.: US11808845Application Date: 2007-06-13
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Publication No.: US07554094B2Publication Date: 2009-06-30
- Inventor: Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
- Applicant: Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
- Applicant Address: DE Oberkochen IL Rehovot
- Assignee: Carl Zeiss SMT A.G.,Applied Materials Israel
- Current Assignee: Carl Zeiss SMT A.G.,Applied Materials Israel
- Current Assignee Address: DE Oberkochen IL Rehovot
- Main IPC: H01J1/50
- IPC: H01J1/50 ; H01J37/28 ; H01J37/244 ; G21K5/10 ; G21K7/00
Abstract:
An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.
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