公开(公告)号：US20100181479A1

公开(公告)日：2010-07-22

申请号：US12459078

申请日：2009-06-25

申请人： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

发明人： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

IPC分类号： H01J3/00 ,  H01J37/02 ,  H01J37/26 ,  H01J37/30

CPC分类号： H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical to element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

摘要翻译： 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US08097847B2

公开(公告)日：2012-01-17

申请号：US12459078

申请日：2009-06-25

申请人： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

发明人： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

IPC分类号： H01J37/30 ,  H01J37/26

CPC分类号： H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

摘要翻译： 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US07554094B2

公开(公告)日：2009-06-30

申请号：US11808845

申请日：2007-06-13

申请人： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

发明人： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

IPC分类号： H01J1/50 ,  H01J37/28 ,  H01J37/244 ,  G21K5/10 ,  G21K7/00

CPC分类号： H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

摘要： An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.

摘要翻译： 电子 - 光学装置提供用于一次电子束的主光束路径和二次电子的次级光束路径。 电子 - 光学装置包括具有第一，第二和第三磁场区域的磁体装置。 第一磁场区域被主光束路径和次光束路径穿过。 第二磁场区域被布置在第一磁场区域的上游的主光束路径中，并且不被辅助光束路径穿过。 第一和第二磁场区域以基本上相反的方向偏转主光束路径。 第三磁场区域布置在第二磁场区域的下游的次级光束路径中，并且不被第一光束路径穿过。 第一和第三磁场区域以基本上相同的方向偏转次级光束路径。

公开(公告)号：US20080054184A1

公开(公告)日：2008-03-06

申请号：US11808845

申请日：2007-06-13

申请人： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

发明人： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

IPC分类号： H01J1/50

CPC分类号： H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

摘要： An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.

摘要翻译： 电子 - 光学装置提供用于一次电子束的主光束路径和二次电子的次级光束路径。 电子 - 光学装置包括具有第一，第二和第三磁场区域的磁体装置。 第一磁场区域被主光束路径和次光束路径穿过。 第二磁场区域被布置在第一磁场区域的上游的主光束路径中，并且不被辅助光束路径穿过。 第一和第二磁场区域以基本上相反的方向偏转主光束路径。 第三磁场区域布置在第二磁场区域的下游的次级光束路径中，并且不被第一光束路径穿过。 第一和第三磁场区域以基本上相同的方向偏转次级光束路径。

公开(公告)号：US08637834B2

公开(公告)日：2014-01-28

申请号：US13342017

申请日：2011-12-31

申请人： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximillian Haider ,  Antonio Casares ,  Steven Rogers

发明人： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximillian Haider ,  Antonio Casares ,  Steven Rogers

IPC分类号： H01J37/28 ,  H01J3/14 ,  H01J1/50

CPC分类号： H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

摘要翻译： 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US20110160030A1

公开(公告)日：2011-06-30

申请号：US12928701

申请日：2010-12-16

申请人： Andreas Heilmann ,  Heiko Mueller ,  Kai Marschner ,  Bert-Olaf Grimm

发明人： Andreas Heilmann ,  Heiko Mueller ,  Kai Marschner ,  Bert-Olaf Grimm

IPC分类号： B04B15/02

CPC分类号： B04B15/02

摘要： A laboratory centrifuge according to the invention provides much better de-mixing rates of centrifuged samples since providing at least one rotation compressor introduces substantially less vibration into the laboratory centrifuge, so that much lower remixing rates are provided.

摘要翻译： 根据本发明的实验室离心机提供离心样品的更好的去混合速率，因为提供至少一个旋转压缩机将实质上更少的振动引入实验室离心机，从而提供更低的再混合速率。

公开(公告)号：US06605778B2

公开(公告)日：2003-08-12

申请号：US09969719

申请日：2001-10-02

申请人： Helmut Dörfler ,  Heiko Mueller ,  Sebastian Raith

发明人： Helmut Dörfler ,  Heiko Mueller ,  Sebastian Raith

IPC分类号： H05K500

CPC分类号： H05K1/0207 ,  H01L23/367 ,  H01L23/3677 ,  H01L2924/0002 ,  H05K1/0206 ,  H05K3/429 ,  H05K2201/066 ,  H05K2201/09309 ,  H05K2201/09536 ,  H05K2201/10689 ,  H01L2924/00

摘要： A circuit carrier (2) (printed circuit board 2) has two metallic outer layers (13, 14) and at least one metallic intermediate layer (11, 12). Insulating layers (8, 9) are arranged between the outer layers (13, 14) and the intermediate layer (11, 12). A component (3, 5) to be cooled and a cooling element (6, 7) are arranged on the outer layers (13, 14). The cooling element (6, 7) is thermally coupled to the component (3, 5) to be cooled via a heat conducting path. The heat conducting path runs partly in the intermediate layer (11, 12). Heat is transferred transversely in said path.

公开(公告)号：US09044345B2

公开(公告)日：2015-06-02

申请号：US11752105

申请日：2007-05-22

申请人： Blaine Warkentine ,  Heiko Mueller

发明人： Blaine Warkentine ,  Heiko Mueller

IPC分类号： A61F2/32 ,  A61B17/56 ,  A61F2/46 ,  A61B17/17 ,  A61B19/00 ,  A61B17/00 ,  A61F2/34 ,  A61F2/36 ,  A61F2/30

CPC分类号： A61F2/4657 ,  A61B17/1746 ,  A61B17/175 ,  A61B34/10 ,  A61B34/20 ,  A61B34/25 ,  A61B90/36 ,  A61B2017/00017 ,  A61B2017/00199 ,  A61B2017/00716 ,  A61B2034/101 ,  A61B2034/108 ,  A61B2034/2055 ,  A61B2034/256 ,  A61B2090/067 ,  A61B2090/3983 ,  A61F2/32 ,  A61F2/34 ,  A61F2/36 ,  A61F2/4607 ,  A61F2/4609 ,  A61F2002/30948 ,  A61F2002/4632 ,  A61F2002/4633 ,  A61F2002/4668

摘要： A method for placing a pelvic implant including a cup and a femoral stem includes planning at least one of a location of the cup within a pelvis and a location of the stem within a femur such that a combined anteversion between a predetermined cup component and a predetermined femoral stem component satisfies a predetermined combined anteversion.

摘要翻译： 一种用于放置包括杯和股骨柄的骨盆植入物的方法包括计划在骨盆内的杯的位置和股骨内的杆的位置中的至少一个，使得在预定的杯部件和预定的杯部件之间的组合的前倾 股骨柄部件满足预定的组合前倾。

公开(公告)号：US20140330519A1

公开(公告)日：2014-11-06

申请号：US14267890

申请日：2014-05-01

申请人： Heiko Mueller

发明人： Heiko Mueller

IPC分类号： G01N33/24

CPC分类号： G01V99/00

摘要： A method is presented for identifying anomalies based on the dissimilarity and similarity between multivariate samples. A step like procedure applies Dissimilarity- and Similarity computation in a sequenced fashion that considers variable variance, variable correlation and variable distribution pattern of the samples. The spatial interdependency of samples is assessed to deduce the nature of the anomaly. Similarity computation of samples is used to identify weak anomalies that are difficult to detect by conventional exploration methods.

摘要翻译： 提出了一种基于多变量样本之间的相似性和相似度来识别异常的方法。 类似步骤的步骤以考虑样本的可变方差，可变相关性和可变分布模式的顺序方式应用不相似性和相似性计算。 评估样本的空间相互依赖性以推断异常的性质。 样本的相似度计算用于识别常规勘探方法难以检测的弱异常。

公开(公告)号：US07822588B2

公开(公告)日：2010-10-26

申请号：US11755024

申请日：2007-05-30

申请人： Heiko Mueller ,  Robert Dick ,  Martin Adamski ,  Gregor Tuma

发明人： Heiko Mueller ,  Robert Dick ,  Martin Adamski ,  Gregor Tuma

IPC分类号： G06G7/48

CPC分类号： A61F2/4657 ,  A61B34/10 ,  A61B34/20 ,  A61B90/36 ,  A61B2017/00712 ,  A61B2034/102 ,  A61B2034/104 ,  A61B2034/105 ,  A61B2034/108 ,  A61B2034/2055 ,  A61B2034/2068 ,  A61F2/36 ,  A61F2/3603 ,  A61F2002/4633

摘要： A method for selecting a femoral implant based on models of a femoral neck and/or a femoral head of a patient is provided. A femoral neck model and/or femoral head model is produced from three-dimensional reference point spatial positions of the femoral neck or head, and a base size of a femoral implant model is ascertained based on the femoral head model. A femoral implant model is produced from the base size, and the implant model is positioned at a position in or on the femoral head model. An implant value is ascertained that indicates how many or what proportion of the ascertained reference point spatial positions are outside the implant model. If the implant value exceeds a predetermined value, the implant model is repositioned and the process is repeated. If the implant value does not exceed the value, an appropriate size and position of the implant is determined.

摘要翻译： 提供了一种基于患者的股骨颈和/或股骨头的模型来选择股骨植入物的方法。 股骨颈模型和/或股骨头模型由股骨颈或头部的三维参考点空间位置产生，并且基于股骨头模型确定股骨植入物模型的基本尺寸。 从基座尺寸产生股骨植入物模型，并且将植入物模型定位在股骨头模型中或股骨头模型上的位置。 确定植入值，其指示所确定的参考点空间位置在植入物模型之外的数量或多少比例。 如果植入值超过预定值，则重新定位植入物模型并重复该过程。 如果植入值不超过该值，则确定植入物的适当尺寸和位置。