发明授权
US07564557B2 Apparatus and methods for detecting overlay errors using scatterometry
有权
使用散射法检测重叠误差的装置和方法
- 专利标题： Apparatus and methods for detecting overlay errors using scatterometry
- 专利标题（中）： 使用散射法检测重叠误差的装置和方法
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申请号： US11926603申请日： 2007-10-29
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公开(公告)号： US07564557B2公开(公告)日： 2009-07-21
- 发明人: Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Anatoly Fabrikant
- 申请人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Anatoly Fabrikant
- 申请人地址： US CA Milpitas
- 专利权人： KLA-Tencor Technologies Corp.
- 当前专利权人： KLA-Tencor Technologies Corp.
- 当前专利权人地址： US CA Milpitas
- 代理机构： Weaver Austin Villeneuve & Sampson LLP
- 主分类号： G01B11/00
- IPC分类号： G01B11/00 ; G01B11/14 ; G01B11/04 ; G01B11/08 ; G01N21/00 ; G01N23/00 ; G01N21/86 ; G21K7/00 ; G01V8/00
摘要：
Disclosed is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.
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