公开(公告)号：US07301634B2

公开(公告)日：2007-11-27

申请号：US10785821

申请日：2004-02-23

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Anatoly Fabrikant ,  Mark Ghinovker ,  Piotr Zalicki ,  Dan Wack

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Anatoly Fabrikant ,  Mark Ghinovker ,  Piotr Zalicki ,  Dan Wack

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an interferometer is employed to modulate substantially a plurality of wavelengths of a broadband source and then acquiring one or more images of the periodic targets. There are predefined offsets between the first and second structures. An overlay error between the first and second structures is then determined by analyzing the one or more acquired images from the periodic targets using a scatterometry overlay technique based on the predefined offsets.

摘要翻译： 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由样本的第二层形成的第二结构的多个周期性目标，使用干涉仪来调制宽带源的基本上多个波长，然后获取一个或 更多图像的周期性目标。 在第一和第二结构之间有预定义的偏移。 然后通过使用基于预定义的偏移的散射测量覆盖技术来分析来自周期性目标的一个或多个获取的图像来确定第一和第二结构之间的重叠误差。

公开(公告)号：US07564557B2

公开(公告)日：2009-07-21

申请号：US11926603

申请日：2007-10-29

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant

IPC分类号： G01B11/00 ,  G01B11/14 ,  G01B11/04 ,  G01B11/08 ,  G01N21/00 ,  G01N23/00 ,  G01N21/86 ,  G21K7/00 ,  G01V8/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.

摘要翻译： 公开了一种组合的散射测量标记，其包括能够被测量以确定CD或轮廓信息的散射关键维度（CD）或轮廓目标，以及布置在散射测量CD或轮廓目标上的散射测绘覆盖目标，散射测绘覆盖目标与散射光谱CD 或轮廓目标以形成能够被测量以确定覆盖的散射测量标记。

公开(公告)号：US20090284744A1

公开(公告)日：2009-11-19

申请号：US12505311

申请日：2009-07-17

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed are apparatus and methods for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample. Targets A, B, C and D that each include a portion of the first and second structures are provided. The target A is designed to have an offset Xa between its first and second structures portions; the target B is designed to have an offset Xb between its first and second structures portions; the target C is designed to have an offset Xc between its first and second structures portions; and the target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is different from zero, and Xa is an opposite sign and differ from Xb. Offset Xc is an opposite sign and differs from Xd. The offsets Xa, Xb, Xc and Xd are selected so that an overlay error, including the respective offset, is within a linear region of overlay values. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra SA, SB, SC, and SD from targets A, B, C, and D, respectively, and any overlay error between the first structures and the second structures is determined using a linear or phase based scatterometry technique based on the obtained spectra SA, SB, SC, and SD.

摘要翻译： 公开了用于确定样品的第一层中的多个第一结构与样品的第二层中的多个第二结构之间的叠层的装置和方法。 提供了各自包括第一和第二结构的一部分的目标A，B，C和D。 目标A设计成在其第一和第二结构部分之间具有偏移Xa; 目标B被设计成在其第一和第二结构部分之间具有偏移Xb; 目标C被设计成在其第一和第二结构部分之间具有偏移Xc; 并且目标D被设计成在其第一和第二结构部分之间具有偏移Xd。 偏移量Xa，Xb，Xc和Xd中的每一个与零不同，并且Xa是相反的符号，并且与Xb不同。 偏移Xc是相反的符号，不同于Xd。 选择偏移Xa，Xb，Xc和Xd，使得包括相应偏移的重叠误差在叠加值的线性区域内。 目标A，B，C和D被电磁辐射照射，分别从目标A，B，C和D获得光谱SA，SB，SC和SD，第一结构和第二结构之间的任何重叠误差 使用基于获得的光谱SA，SB，SC和SD的基于线性或相位的散射测量技术来确定。

公开(公告)号：US07289213B2

公开(公告)日：2007-10-30

申请号：US10785732

申请日：2004-02-23

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant

IPC分类号： G01B11/00 ,  G01B11/24 ,  G01B11/30 ,  G01B11/14 ,  H01L21/76 ,  H01L23/544

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.

摘要翻译： Disclose是一个组合的散点图标记，包括能够被测量以确定CD或轮廓信息的散射关键维度（CD）或轮廓目标，以及布置在散射测量CD或轮廓目标上的散射测绘覆盖目标，散射测绘覆盖目标与散射光谱CD协调 或轮廓目标以形成能够被测量以确定覆盖的散射测量标记。

公开(公告)号：US07385699B2

公开(公告)日：2008-06-10

申请号：US10785396

申请日：2004-02-23

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  Mark Ghinovker

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  Mark Ghinovker

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure a plurality of measured optical signals from a plurality of periodic targets on the sample. The targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures. A scatterometry overlay technique is then used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets.

公开(公告)号：US07876440B2

公开(公告)日：2011-01-25

申请号：US12505311

申请日：2009-07-17

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed are apparatus and methods for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample. Targets A, B, C and D that each include a portion of the first and second structures are provided. The target A is designed to have an offset Xa between its first and second structures portions; the target B is designed to have an offset Xb between its first and second structures portions; the target C is designed to have an offset Xc between its first and second structures portions; and the target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is different from zero, and Xa is an opposite sign and differ from Xb.

摘要翻译： 公开了用于确定样品的第一层中的多个第一结构与样品的第二层中的多个第二结构之间的叠层的装置和方法。 提供了各自包括第一和第二结构的一部分的目标A，B，C和D。 目标A设计成在其第一和第二结构部分之间具有偏移Xa; 目标B被设计成在其第一和第二结构部分之间具有偏移Xb; 目标C被设计成在其第一和第二结构部分之间具有偏移Xc; 并且目标D被设计成在其第一和第二结构部分之间具有偏移Xd。 偏移量Xa，Xb，Xc和Xd中的每一个与零不同，并且Xa是相反的符号，并且与Xb不同。

公开(公告)号：US07433040B2

公开(公告)日：2008-10-07

申请号：US11830798

申请日：2007-07-30

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  Mark Ghinovker

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  Mark Ghinovker

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure a plurality of measured optical signals from a plurality of periodic targets on the sample. The targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures. A scatterometry overlay technique is then used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets.

摘要翻译： 公开了一种用于确定多层样品中至少两层之间的覆盖误差的方法。 成像光学系统用于从样本上的多个周期性目标测量多个测量的光信号。 目标各自具有第一层中的第一结构和第二层中的第二结构。 在第一和第二结构之间有预定义的偏移。 然后使用散射测量覆盖技术来分析周期性目标的测量光信号和周期性目标的第一和第二结构的预定偏移量，从而确定周期性目标的第一和第二结构之间的重叠误差。

公开(公告)号：US07317531B2

公开(公告)日：2008-01-08

申请号：US10729838

申请日：2003-12-05

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

IPC分类号： G01B11/00 ,  G01J4/00 ,  G01N21/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. In one embodiment, a method for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample is disclosed. Targets A, B, C and D that each include a portion of the first and second structures are provided. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb between its first and second structures portions; target C is designed to have an offset Xc between its first and second structures portions; and target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra SA, SB, SC, and SD from targets A, B, C, and D, respectively. Any overlay error between the first structures and the second structures is then determined using a linear approximation based on the obtained spectra SA, SB, SC, and SD.

摘要翻译： 公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。 在一个实施例中，公开了一种用于确定样品的第一层中的多个第一结构与样品的第二层中的多个第二结构之间的叠层的方法。 提供了各自包括第一和第二结构的一部分的目标A，B，C和D。 目标A设计成在其第一和第二结构部分之间具有偏移Xa; 目标B设计成在其第一和第二结构部分之间具有偏移Xb; 目标C被设计成在其第一和第二结构部分之间具有偏移Xc; 并且目标D被设计成在其第一和第二结构部分之间具有偏移Xd。 偏移量Xa，Xb，Xc和Xd中的每一个优选地不同于零; Xa是相反的符号，不同于Xb; Xc是相反的符号，与Xd不同。 目标A，B，C和D用电磁辐射照射，以获得光谱S A，B，C，S和S， 分别来自目标A，B，C和D的SUB> D

公开(公告)号：US07298481B2

公开(公告)日：2007-11-20

申请号：US10785395

申请日：2004-02-23

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant ,  Mark Ghinovker ,  John Fielden ,  Noah Bareket

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant ,  Mark Ghinovker ,  John Fielden ,  Noah Bareket

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets target that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, a plurality of optical signals are measured at a plurality of incident angles, wherein there are predefined offsets between the first and second structures. An overlay error is then determined between the first and second structures by analyzing the measured optical signals at the plurality of incident angles from the periodic targets using a scatterometry overlay technique based on the predefined offsets without using a calibration operation.

摘要翻译： 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标中的每一个，多个光信号以多个入射角测量，其中存在 第一和第二结构之间的预定偏移量。 然后，在不使用校准操作的情况下，通过使用基于预定义的偏移的散射测量覆盖技术来分析来自周期性靶的多个入射角的测量光信号，从而在第一和第二结构之间确定覆盖误差。

公开(公告)号：US07379183B2

公开(公告)日：2008-05-27

申请号：US10785731

申请日：2004-02-23

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Christopher F. Bevis ,  Paola Dececco ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Mark Ghinovker

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Christopher F. Bevis ,  Paola Dececco ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Mark Ghinovker

IPC分类号： G01B11/00 ,  G01B11/02 ,  G01J4/00 ,  G01N21/55

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets.

摘要翻译： 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标，采用光学系统，从而测量来自每个周期性目标的光信号。 在第一和第二结构之间有预定义的偏移。 通过使用基于预定偏移的散射测量覆盖技术来分析来自周期性目标的所测量的光信号，在第一和第二结构之间确定覆盖误差。