发明授权
- 专利标题: Substrate handler, lithographic apparatus and device manufacturing method
- 专利标题(中): 基板处理器,光刻设备和器件制造方法
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申请号: US11175037申请日: 2005-07-06
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公开(公告)号: US07576835B2公开(公告)日: 2009-08-18
- 发明人: Harmen Klaas Van Der Schoot , Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Petrus Matthijs Henricus Vosters , Johannes Martinus Andreas Hazenberg , Aart Adrianus Van Beuzekom
- 申请人: Harmen Klaas Van Der Schoot , Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Petrus Matthijs Henricus Vosters , Johannes Martinus Andreas Hazenberg , Aart Adrianus Van Beuzekom
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号: G03B27/58
- IPC分类号: G03B27/58 ; G03B27/52
摘要:
Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.
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