发明授权
- 专利标题： Process chamber component with layered coating and method
- 专利标题（中）： 具有分层涂层和方法的工艺室组件
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申请号： US10996883申请日： 2004-11-24
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公开(公告)号： US07579067B2公开(公告)日： 2009-08-25
- 发明人: Yixing Lin , Dajiang Xu , Clifford Stow
- 申请人： Yixing Lin , Dajiang Xu , Clifford Stow
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Janah & Associates, P.C.
- 主分类号： B32B5/32
- IPC分类号： B32B5/32 ; B32B3/02 ; B32B5/18 ; C23C14/00
摘要：
A substrate processing chamber component is capable of being exposed to an energized gas in a process chamber. The component has an underlying structure and first and second coating layers. The first coating layer is formed over the underlying structure, and has a first surface with an average surface roughness of less than about 25 micrometers. The second coating layer is formed over the first coating layer, and has a second surface with an average surface roughness of at least about 50 micrometers. Process residues can adhere to the surface of the second coating layer to reduce the contamination of processed substrates.
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