发明授权
- 专利标题： Photomask, and method and apparatus for producing the same
- 专利标题（中）： 光掩模及其制造方法和装置
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申请号： US11878972申请日： 2007-07-30
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公开(公告)号： US07582397B2公开(公告)日： 2009-09-01
- 发明人: Yoshikazu Nagamura , Kouji Tange , Kouki Hayashi , Hidehiro Ikeda
- 申请人： Yoshikazu Nagamura , Kouji Tange , Kouki Hayashi , Hidehiro Ikeda
- 申请人地址： JP Tokyo
- 专利权人： Renesas Technology Corp.
- 当前专利权人： Renesas Technology Corp.
- 当前专利权人地址： JP Tokyo
- 代理机构： McDermott Will & Emery LLP
- 优先权： JPP2003-024125 20030131
- 主分类号： G03F1/00
- IPC分类号： G03F1/00
摘要：
A shading area having a transmissivity in the range of 0 to 2% is formed at the center of a clear defect in a wiring pattern of a half tone mask. Semitransparent areas having a transmissivity in the range of 10 to 25% are formed, adjacently to shading area, in areas extending from the inside of the edge of an imaginary pattern having no defect to the outside of the edge. In this way, in the correction of the defect in the half tone mask, the working accuracy tolerable margin of the correction portion of the defect can be made large.
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