发明授权
- 专利标题： Monitoring system for valve device
- 专利标题（中）： 阀门装置监控系统
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申请号： US11834727申请日： 2007-08-07
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公开(公告)号： US07584668B2公开(公告)日： 2009-09-08
- 发明人: Hiroyuki Ohta , Hiromi Shimazu , Yohei Tanno , Yoshihisa Kiyotoki , Kenji Onodera , Kenji Araki
- 申请人： Hiroyuki Ohta , Hiromi Shimazu , Yohei Tanno , Yoshihisa Kiyotoki , Kenji Onodera , Kenji Araki
- 申请人地址： JP Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Antonelli, Terry, Stout & Kraus, LLP.
- 优先权： JP2006-216367 20060809
- 主分类号： G01B7/16
- IPC分类号： G01B7/16
摘要：
A monitoring system for valve device according to the present invention comprises a semiconductor single crystalline substrate including a bridged circuit and the bridged circuit comprising impurity-diffused resistors. The semiconductor single crystalline substrate is mounted to any of a valve device's valve stem, valve yoke, drive shaft, or elastic body disposed at the end of the drive shaft. Thrust and torque of the valve device are measured by the semiconductor single crystalline substrate and then the measured values are used for monitoring the valve device.
公开/授权文献
- US20080034882A1 MONITORING SYSTEM FOR VALVE DEVICE 公开/授权日：2008-02-14