Invention Grant
- Patent Title: Method for inspecting defect and apparatus for inspecting defect
- Patent Title (中): 检查缺陷的方法和缺陷检查装置
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Application No.: US11770217Application Date: 2007-06-28
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Publication No.: US07586594B2Publication Date: 2009-09-08
- Inventor: Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
- Applicant: Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2002-347134 20021129; JP2002-349357 20021202
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.
Public/Granted literature
- US20070247616A1 METHOD FOR INSPECTING DEFECT AND APPARATUS FOR INSPECTING DEFECT Public/Granted day:2007-10-25
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