Invention Grant
US07609373B2 Reducing variations in energy reflected from a sample due to thin film interference
有权
减少由于薄膜干扰而导致样品反射的能量的变化
- Patent Title: Reducing variations in energy reflected from a sample due to thin film interference
- Patent Title (中): 减少由于薄膜干扰而导致样品反射的能量的变化
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Application No.: US11223851Application Date: 2005-09-09
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Publication No.: US07609373B2Publication Date: 2009-10-27
- Inventor: Yung-Ho Chuang , J. Joseph Armstrong
- Applicant: Yung-Ho Chuang , J. Joseph Armstrong
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corporation
- Current Assignee: KLA-Tencor Technologies Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Smyrski Law Group, A P.C.
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A system and method for inspecting a multi-layer sample, such as a silicon wafer, is disclosed. The design reduces variations in total reflected energy due to thin film interference. The design includes illuminating the sample at two incident angle ranges, where the two incident angle ranges are such that variation in total reflected energy at a first incident angle range may be employed to balance variation in total reflected energy at a second incident angle range. Defects are detected using die-to-die subtraction of the sample illuminated at the two incident angle ranges.
Public/Granted literature
- US20060268265A1 Reducing variations in energy reflected from a sample due to thin film interference Public/Granted day:2006-11-30
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