Invention Grant
- Patent Title: X-ray analysis apparatus and X-ray analysis method
- Patent Title (中): X射线分析仪和X射线分析法
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Application No.: US12369062Application Date: 2009-02-11
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Publication No.: US07623627B2Publication Date: 2009-11-24
- Inventor: Yoshiki Matoba
- Applicant: Yoshiki Matoba
- Applicant Address: JP Chiba
- Assignee: SII NanoTechnology Inc.
- Current Assignee: SII NanoTechnology Inc.
- Current Assignee Address: JP Chiba
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2008-042242 20080222
- Main IPC: G01N23/201
- IPC: G01N23/201

Abstract:
Provided are an X-ray analysis apparatus and an X-ray analysis method, in which a measurer can judge an area incapable of being analyzed in a sample with a concave-convex portion. The X-ray analysis apparatus includes: an X-ray tubular bulb for irradiating an arbitrary irradiation point located on the sample with a radiation beam; an X-ray detector for detecting a characteristic X-ray and a scattered X-ray radiated from the sample and outputting a signal containing energy information on the characteristic X-ray and the scattered X-ray; a narrow-range illumination mechanism and a wide-range illumination mechanism for emitting an illumination light to the sample to illuminate the sample; and a narrow-range observation mechanism and a wide-range observation mechanism for obtaining an illumination image of the sample, which is illuminated with the illumination light, as image data, in which the narrow-range observation mechanism and the wide-range observation mechanism include a narrow-range oblique illumination section and a wide-range oblique illumination section, respectively, in which an optical axis of the illumination light at a time of the illuminating is set toward the irradiation point in the same direction as a direction linking the irradiation point with the X-ray detector at a time of the detecting.
Public/Granted literature
- US20090213996A1 X-RAY ANALYSIS APPARATUS AND X-RAY ANALYSIS METHOD Public/Granted day:2009-08-27
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