Invention Grant
- Patent Title: Fluorescent X-ray analysis apparatus
- Patent Title (中): 荧光X射线分析仪
-
Application No.: US11708789Application Date: 2007-02-20
-
Publication No.: US07634053B2Publication Date: 2009-12-15
- Inventor: Yoshiki Matoba
- Applicant: Yoshiki Matoba
- Applicant Address: JP Chiba
- Assignee: SII NanoTechnology Inc.
- Current Assignee: SII NanoTechnology Inc.
- Current Assignee Address: JP Chiba
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2006-047945 20060224
- Main IPC: G01N23/223
- IPC: G01N23/223

Abstract:
There is provided a fluorescent X-ray analysis apparatus in which a detection lower limit is improved, and it is possible to quantify a trace aimed element having been contained not only in a sample whose main component is a heavy element but also in a sample whose main component is a light element. The fluorescent X-ray analysis apparatus possesses a sample base supporting the sample, an X-ray source irradiating a primary X-ray with a predetermined irradiation position being made a center, and a detector disposed toward the irradiation position and detecting a fluorescent X-ray generated from the sample. The sample base has a detachable sample holding tool fixing the sample while being approached to the X-ray source and the detector, and a measurement is possible by selectively disposing the sample in any one of a 1st inspection position in which an irradiated face is coincided with the irradiation position, or a 2nd inspection position in which the sample is fixed to the sample holding tool, an irradiated face is approached to the X-ray source, and an inspected face is approached to the detector.
Public/Granted literature
- US20070211852A1 Fluorescent X-ray analysis apparatus Public/Granted day:2007-09-13
Information query