Invention Grant
- Patent Title: Methods and apparatus for addition of electrical conductors to previously fabricated device
- Patent Title (中): 将电导体添加到先前制造的器件的方法和装置
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Application No.: US11339102Application Date: 2006-01-23
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Publication No.: US07638366B2Publication Date: 2009-12-29
- Inventor: Morgan T. Johnson
- Applicant: Morgan T. Johnson
- Applicant Address: US OR Hillsboro
- Assignee: Advanced Inquiry Systems, Inc.
- Current Assignee: Advanced Inquiry Systems, Inc.
- Current Assignee Address: US OR Hillsboro
- Agent Raymond J. Werner
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A conductor carrier provides, separately manufactured, conductive pathways, on a wafer level, which may be coupled to a wafer of fully fabricated integrated circuits. Such conductor carriers include an insulating body having two major surfaces with conductors disposed on each of those surfaces, and conductors disposed within the insulating body so as to provide signal continuity between various conductors on each of the two surfaces. An assembly can be formed by permanently or removably attaching the conductor carrier to the wafer. Conductor carriers may include an evacuation pathway suitable for removing air, or other gases, from between the conductor and the wafer so as to create a pressure differential that urges the conductor carrier into contact with the wafer. Conductor carriers may include a groove which is suitable for receiving a sealing ring; and may include a street map which is suitable for providing guidance to a wafer sawing operation.
Public/Granted literature
- US20060121648A1 Methods and apparatus for addition of electrical conductors to previously fabricated device Public/Granted day:2006-06-08
Information query
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