发明授权
- 专利标题: Substrate processing apparatus, control method for the apparatus, and program for implementing the method
- 专利标题(中): 基板处理装置,装置的控制方法和实现该方法的程序
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申请号: US12125959申请日: 2008-05-23
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公开(公告)号: US07640072B2公开(公告)日: 2009-12-29
- 发明人: Noriaki Shimizu , Masahiro Numakura
- 申请人: Noriaki Shimizu , Masahiro Numakura
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2003-383008 20031112
- 主分类号: G06F19/00
- IPC分类号: G06F19/00 ; H01L21/306 ; C23F1/00
摘要:
A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a user. A processing chamber processes semiconductor wafers therein. A transfer chamber transfers the semiconductor wafers. A FOUP (front opening unified pod) houses a plurality of dummy wafers for inspection of the processing chamber or the transfer chamber. A CPU causes an HDD (hard disk drive) to store a housing state relating to the arrangement of the dummy wafers in the FOUP before replacement of dummy wafers in the FOUP and that after the replacement as dummy wafer setup information.
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