发明授权
US07640072B2 Substrate processing apparatus, control method for the apparatus, and program for implementing the method 有权
基板处理装置,装置的控制方法和实现该方法的程序

Substrate processing apparatus, control method for the apparatus, and program for implementing the method
摘要:
A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a user. A processing chamber processes semiconductor wafers therein. A transfer chamber transfers the semiconductor wafers. A FOUP (front opening unified pod) houses a plurality of dummy wafers for inspection of the processing chamber or the transfer chamber. A CPU causes an HDD (hard disk drive) to store a housing state relating to the arrangement of the dummy wafers in the FOUP before replacement of dummy wafers in the FOUP and that after the replacement as dummy wafer setup information.
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