发明授权
US07645556B2 Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same
失效
用于形成有机绝缘膜的组合物和使用其形成有机绝缘膜的图案的方法
- 专利标题： Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same
- 专利标题（中）： 用于形成有机绝缘膜的组合物和使用其形成有机绝缘膜的图案的方法
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申请号： US11156489申请日： 2005-06-21
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公开(公告)号： US07645556B2公开(公告)日： 2010-01-12
- 发明人: Jung Han Shin , Tae Woo Lee , Bon Won Koo , Bang Lin Lee , Sang Yoon Lee
- 申请人： Jung Han Shin , Tae Woo Lee , Bon Won Koo , Bang Lin Lee , Sang Yoon Lee
- 申请人地址： KR Gyeonggi-do
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Gyeonggi-do
- 代理机构： Harness, Dickey & Pierce, P.L.C.
- 优先权： KR10-2004-0046177 20040621; KR10-2005-0047107 20050602
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/004
摘要：
A photo-patternable composition for forming an organic insulating film which includes (i) a functional group-containing monomer, (ii) an initiator generating an acid or a radical upon light irradiation, and (iii) an organic or inorganic polymer. Further disclosed is a method for forming a pattern of an organic insulating film using the composition. Since an organic insulating film can be simply patterned without involving any photoresist process, the overall procedure is simplified and eventually an organic thin film transistor with high charge carrier mobility can be fabricated by all wet processes.
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