发明授权
US07645664B1 Layout pattern for deep well region to facilitate routing body-bias voltage
有权
用于深井区域的布局图,以方便路偏偏置电压
- 专利标题: Layout pattern for deep well region to facilitate routing body-bias voltage
- 专利标题(中): 用于深井区域的布局图,以方便路偏偏置电压
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申请号: US11449952申请日: 2006-06-08
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公开(公告)号: US07645664B1公开(公告)日: 2010-01-12
- 发明人: Mike Pelham , James B. Burr
- 申请人: Mike Pelham , James B. Burr
- 主分类号: H01L21/8238
- IPC分类号: H01L21/8238 ; H01L29/76
摘要:
Layout patterns for the deep well region to facilitate routing the body-bias voltage in a semiconductor device are provided and described. The layout patterns include a diagonal sub-surface mesh structure, an axial sub-surface mesh structure, a diagonal sub-surface strip structure, and an axial sub-surface strip structure. A particular layout pattern is selected for an area of the semiconductor device according to several factors.
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