发明授权
- 专利标题: Thin-film device
- 专利标题(中): 薄膜装置
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申请号: US11701361申请日: 2007-02-02
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公开(公告)号: US07649251B2公开(公告)日: 2010-01-19
- 发明人: Hajime Kuwajima , Masahiro Itoh , Masahiro Miyazaki , Akira Furuya
- 申请人: Hajime Kuwajima , Masahiro Itoh , Masahiro Miyazaki , Akira Furuya
- 申请人地址: JP Tokyo
- 专利权人: TDK Corporation
- 当前专利权人: TDK Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2006-041226 20060217
- 主分类号: H01L23/48
- IPC分类号: H01L23/48
摘要:
A thin-film device incorporates: a substrate; an insulating layer, a plurality of lower conductor layers, a dielectric film, an insulating layer, a plurality of upper conductor layers and a protection film that are stacked in this order on the substrate; and a plurality of terminal electrodes. One of the terminal electrodes is connected to one of the lower conductor layers. The one of the lower conductor layers has a protruding portion that protrudes to extend more outward in a lateral direction than a side surface of the insulating layer. The one of the terminal electrodes has a concave portion that accommodates and touches at least part of the protruding portion, and touches the side surface of the insulating layer.
公开/授权文献
- US20070194345A1 Thin-film device 公开/授权日:2007-08-23
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