发明授权
- 专利标题: Immersion lithography objective
- 专利标题(中): 浸没光刻目标
-
申请号: US12019830申请日: 2008-01-25
-
公开(公告)号: US07649702B2公开(公告)日: 2010-01-19
- 发明人: Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
- 申请人: Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
- 申请人地址: DE NL
- 专利权人: Carl Zeiss SMT AG,ASML Netherlands B.V.
- 当前专利权人: Carl Zeiss SMT AG,ASML Netherlands B.V.
- 当前专利权人地址: DE NL
- 代理机构: GrayRobinson, P.A.
- 主分类号: G02B7/02
- IPC分类号: G02B7/02 ; G02B3/00 ; G02B3/12
摘要:
An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.
公开/授权文献
- US20080212211A1 IMMERSION LITHOGRAPHY OBJECTIVE 公开/授权日:2008-09-04
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |