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公开(公告)号:US07649702B2
公开(公告)日:2010-01-19
申请号:US12019830
申请日:2008-01-25
申请人: Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
发明人: Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
CPC分类号: G03F7/70341 , G03F7/70825
摘要: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.
摘要翻译: 浸没式光刻物镜具有其中布置有至少一个第一光学元件的壳体,沿着物镜的光轴方向跟随第一光学元件的第二光学元件,与第二光学元件邻接的浸没介质, 位于后者的光轴的方向的下游,以及用于第二光学元件的保持结构。 保持结构在光轴的方向上具有比垂直于光轴的方向更大的刚度。
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公开(公告)号:US20080212211A1
公开(公告)日:2008-09-04
申请号:US12019830
申请日:2008-01-25
申请人: Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
发明人: Bernhard Gellrich , Paul Graeupner , Juergen Fischer , Andreas Wurmbrand , Bauke Jansen , Bob Streefkerk , Christiaan Alexander Hoogendam , Johannes Jacobus Matheus Baselmans
CPC分类号: G03F7/70341 , G03F7/70825
摘要: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.
摘要翻译: 浸没式光刻物镜具有其中布置有至少一个第一光学元件的壳体,沿着物镜的光轴方向跟随第一光学元件的第二光学元件,与第二光学元件邻接的浸没介质, 位于后者的光轴的方向的下游,以及用于第二光学元件的保持结构。 保持结构在光轴的方向上具有比垂直于光轴的方向更大的刚度。
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公开(公告)号:US09104117B2
公开(公告)日:2015-08-11
申请号:US13685410
申请日:2012-11-26
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
CPC分类号: G03F7/70341 , G03F7/70866 , G03F9/7026 , G03F9/7034
摘要: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
摘要翻译: 浸没式光刻在基材曝光完成后,检测器用于检测残留在基片和/或基片台上的任何残留液体。
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公开(公告)号:US08964164B2
公开(公告)日:2015-02-24
申请号:US13188026
申请日:2011-07-21
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译: 在光刻设备中,将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度,以将液体供应系统保持在基板表面上方的预定高度。
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公开(公告)号:US08547519B2
公开(公告)日:2013-10-01
申请号:US12411952
申请日:2009-03-26
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC分类号: G03B27/52
CPC分类号: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号:US08354209B2
公开(公告)日:2013-01-15
申请号:US13331865
申请日:2011-12-20
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
IPC分类号: G03F9/00
CPC分类号: G03F9/7023 , G03F7/70341 , G03F7/70883
摘要: A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.
摘要翻译: 光刻设备包括被配置为保持图案形成装置的支撑结构,所述图案形成装置被配置成在其横截面中赋予图案的辐射束; 被配置为保持基板的基板台; 投影系统,被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统,被配置为向所述投影系统和所述基板台之间的空间提供液体; 传感器,被配置为使用通过所述液体投影的测量光束来测量曝光参数; 以及校正系统,其被配置为基于影响使用所述测量光束进行的测量的物理属性的变化来确定偏移,以至少部分地校正所测量的曝光参数。
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公开(公告)号:US08102507B2
公开(公告)日:2012-01-24
申请号:US12694880
申请日:2010-01-27
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
CPC分类号: G03F9/7023 , G03F7/70341 , G03F7/70883
摘要: A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.
摘要翻译: 光刻设备包括被配置为保持图案形成装置的支撑结构,所述图案形成装置被配置成在其横截面中赋予图案的辐射束; 被配置为保持基板的基板台; 投影系统,被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统,被配置为向所述投影系统和所述基板台之间的空间提供液体; 传感器,被配置为使用通过所述液体投影的测量光束来测量曝光参数; 以及校正系统,其被配置为基于影响使用所述测量光束进行的测量的物理属性的变化来确定偏移,以至少部分地校正所测量的曝光参数。
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公开(公告)号:US07670730B2
公开(公告)日:2010-03-02
申请号:US11298942
申请日:2005-12-12
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
CPC分类号: G03F9/7023 , G03F7/70341 , G03F7/70883
摘要: A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter. Also, there is provided an apparatus and method to measure a height of an optical element connected to liquid between the projection system and the substrate table in the immersion lithographic apparatus.
摘要翻译: 提供了一种用于校正浸没式光刻设备的曝光参数的方法。 在该方法中,使用通过投影系统和浸没式光刻设备的衬底台之间的液体投影的测量光束来测量曝光参数,并且基于影响使用测量光束进行的测量的物理性质的变化来确定偏移 至少部分地校正测量的曝光参数。 此外,提供了一种用于在浸没式光刻设备中测量连接到投影系统和基板台之间的液体的光学元件的高度的装置和方法。
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公开(公告)号:US20080218717A1
公开(公告)日:2008-09-11
申请号:US12068546
申请日:2008-02-07
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号: G03B27/42
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号:US20080192219A1
公开(公告)日:2008-08-14
申请号:US12081291
申请日:2008-04-14
申请人: Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人: Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号: G03B27/42
CPC分类号: G03F9/7034 , G03F7/70341
摘要: A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which leveling and exposure are performed simultaneously.
摘要翻译: 在用于浸没式光刻的实施例中的光刻设备和方法被公开在其中同时执行调平和曝光的单个阶段。
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