Invention Grant
- Patent Title: Method for forming a vapor phase growth film
- Patent Title (中): 形成气相生长膜的方法
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Application No.: US11407354Application Date: 2006-04-20
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Publication No.: US07651733B2Publication Date: 2010-01-26
- Inventor: Kazuhide Hasebe , Hiroyuki Yamamoto , Takahito Umehara , Masato Kawakami
- Applicant: Kazuhide Hasebe , Hiroyuki Yamamoto , Takahito Umehara , Masato Kawakami
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2001-128068 20010425; WOPCT/JP02/02378 20020313
- Main IPC: C23C16/00
- IPC: C23C16/00

Abstract:
A vapor-phase growing unit of this invention includes: a reaction container in which a substrate is arranged, a first gas-introducing part having a first gas-introducing tube in which a gas-spouting port opening in the reaction container is formed, the first gas-introducing part serving to supply into the reaction container a first gas consisting of an organic-metal including gas, and a second gas-introducing part having a second gas-introducing tube in which a gas-spouting port opening in the reaction container is formed, the second gas-introducing part serving to supply into the reaction container a second gas which reacts with the organic-metal including gas and whose density is smaller than that of the organic-metal including gas. The gas-spouting port of the first gas-introducing tube and the gas-spouting port of the second gas-introducing tube are arranged along an outside periphery of the substrate arranged in the reaction container.
Public/Granted literature
- US20060257568A1 Vapor-phase growing unit Public/Granted day:2006-11-16
Information query
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