发明授权
US07655579B2 Method for improving heat transfer of a focus ring to a target substrate mounting device
有权
用于改善聚焦环向目标基板安装装置的传热的方法
- 专利标题： Method for improving heat transfer of a focus ring to a target substrate mounting device
- 专利标题（中）： 用于改善聚焦环向目标基板安装装置的传热的方法
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申请号： US11970612申请日： 2008-01-08
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公开(公告)号： US07655579B2公开(公告)日： 2010-02-02
- 发明人: Masaaki Miyagawa , Akihiro Yoshimura
- 申请人： Masaaki Miyagawa , Akihiro Yoshimura
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2007-001809 20070109
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A focus ring heat transfer method improves heat transfer of a focus ring arranged in an outer peripheral portion of a mounting surface of a mounting table adapted to mount a target substrate in a chamber. The method includes steps of: disposing a heat transfer sheet between the focus ring and the mounting table; and vacuum-evacuating the chamber prior to processing the target substrate and then restoring the pressure the inside of the chamber to an atmospheric pressure or a light vacuum pressure. Therefore, air present in a fine gap between the heat transfer sheet and the mounting surface is removed to allow the heat transfer sheet to adhere to the mounting surface.