发明授权
US07663139B2 Optical semiconductor device and manufacturing method of the same 有权
光半导体器件及其制造方法

Optical semiconductor device and manufacturing method of the same
摘要:
A side barrier is provided between columnar dots each constituted by directly stacking respective quantum dots in seven or more layers. Out of respective side barrier layers composing the side barrier, each of the lower side barrier layers (four layers of the undermost layer to the fourth layer from the bottom) is formed as a first side barrier layer into which a tensile strain is introduced, and each of the upper side barrier layers (three layers of the fifth layer to the uppermost layer from the bottom) is formed as a second side barrier layer which has no strain.
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