Invention Grant
US07666708B2 Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors, and fabricating such devices
有权
掺杂的细长半导体,生长这样的半导体,包括这种半导体的器件,以及制造这样的器件
- Patent Title: Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors, and fabricating such devices
- Patent Title (中): 掺杂的细长半导体,生长这样的半导体,包括这种半导体的器件,以及制造这样的器件
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Application No.: US11543352Application Date: 2006-10-04
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Publication No.: US07666708B2Publication Date: 2010-02-23
- Inventor: Charles M. Lieber , Yi Cui , Xiangfeng Duan , Yu Huang
- Applicant: Charles M. Lieber , Yi Cui , Xiangfeng Duan , Yu Huang
- Applicant Address: US MA Cambridge
- Assignee: President and Fellows of Harvard College
- Current Assignee: President and Fellows of Harvard College
- Current Assignee Address: US MA Cambridge
- Agency: Wolf, Greenfield & Sacks, P.C.
- Main IPC: H01L51/40
- IPC: H01L51/40 ; D01C5/00 ; D01F9/12

Abstract:
A bulk-doped semiconductor that is at least one of the following: a single crystal, an elongated and bulk-doped semiconductor that, at any point along its longitudinal is, axis, has a largest cross-sectional dimension less than 500 nanometers, and a free-standing and bulk-doped semiconductor with at least one portion having a smallest width of less than 500 nanometers. At least one portion of such a semiconductor may a smallest width of less than 200 nanometers, or less than 150 nanometers, or less than 100 nanometers, or less than 80 nanometers, or less than 70 nanometers, or less than 60 nanometers, or less than 40 nanometers, or less than 20 nanometers, or less than 10 nanometers, or even less an 5 nanometers. Such a semiconductor may be doped during growth. Such a semiconductor may be part of a device, which may include any of a variety of devices and combinations thereof, and a variety assembling techniques may be used to fabricate devices from such a semiconductor.
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