Invention Grant
- Patent Title: Method for direct bonding two semiconductor substrates
- Patent Title (中): 用于直接接合两个半导体衬底的方法
-
Application No.: US11624070Application Date: 2007-01-17
-
Publication No.: US07670929B2Publication Date: 2010-03-02
- Inventor: Konstantin Bourdelle , Carlos Mazure , Olivier Rayssac
- Applicant: Konstantin Bourdelle , Carlos Mazure , Olivier Rayssac , Pierre Rayssac, legal representative , Giséle Rayssac, legal representative
- Applicant Address: FR Bernin
- Assignee: S.O.I. Tec Silicon on Insulator Technologies
- Current Assignee: S.O.I. Tec Silicon on Insulator Technologies
- Current Assignee Address: FR Bernin
- Agency: Winston & Strawn LLP
- Priority: FR0606311 20060711
- Main IPC: H01L21/30
- IPC: H01L21/30

Abstract:
The invention provides methods of direct bonding substrates at least one of which includes a layer of semiconductor material that extends over its front face or in the proximity thereof. The provided methods include, prior to bonding, subjecting the bonding face of at least one substrate comprising a semiconductor material to selected heat treatment at a selected temperature and in a selected gaseous atmosphere. The bonded substrates are useful for electronic, optic, or optoelectronic applications.
Public/Granted literature
- US20080014712A1 METHOD FOR DIRECT BONDING TWO SEMICONDUCTOR SUBSTRATES Public/Granted day:2008-01-17
Information query
IPC分类: