Method for direct bonding two semiconductor substrates
    2.
    发明授权
    Method for direct bonding two semiconductor substrates 有权
    用于直接接合两个半导体衬底的方法

    公开(公告)号:US07670929B2

    公开(公告)日:2010-03-02

    申请号:US11624070

    申请日:2007-01-17

    IPC分类号: H01L21/30

    CPC分类号: H01L21/187

    摘要: The invention provides methods of direct bonding substrates at least one of which includes a layer of semiconductor material that extends over its front face or in the proximity thereof. The provided methods include, prior to bonding, subjecting the bonding face of at least one substrate comprising a semiconductor material to selected heat treatment at a selected temperature and in a selected gaseous atmosphere. The bonded substrates are useful for electronic, optic, or optoelectronic applications.

    摘要翻译: 本发明提供了直接接合基底的方法,其中至少一个包括在其前表面或其附近延伸的半导体材料层。 所提供的方法包括,在接合之前,使包含半导体材料的至少一个衬底的结合面在所选择的温度和选定的气体气氛中进行选择的热处理。 键合的衬底可用于电子,光学或光电子应用。